SCHEMBL6753550

SCHEMBL6753550

CCCCCC1CCC(S(=O)(=O)CS(=O)(=O)C2CCC(CCCCC)CC2)CC1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
PKM P14618 1/20 0.43
CYP1A2 P05177 5/20 0.42
TP53 P04637 1/20 0.40
EPHX1 P07099 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
HPGD P15428 2/20 0.37
POLB P06746 1/20 0.37
LSS P48449 2/20 0.36
ALDH1A1 P00352 1/20 0.36
MAPK1 P28482 2/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
S1PR2 O95136 1/20 0.33
S1PR4 O95977 1/20 0.33
S1PR1 P21453 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6753479 0.94 CYP1A2 (0.48) HTTMEN1KMT2APKMCYP1A2
SCHEMBL6755834 0.86 CYP2C9 (0.34) HTTMEN1KMT2ACYP1A2CYP2C9
SCHEMBL19733484 0.83 HTT (0.51) HTTMEN1KMT2APKMCYP1A2
SCHEMBL3002424 0.81 CYP1A2 (0.59) HTTMEN1KMT2APKMCYP1A2
SCHEMBL6031279 0.81 CYP1A2 (0.59) HTTMEN1KMT2APKMCYP1A2
SCHEMBL10569325 0.81 CYP1A2 (0.59) HTTMEN1KMT2APKMCYP1A2
SCHEMBL6753110 0.81 CYP1A2 (0.59) HTTMEN1KMT2APKMCYP1A2
SCHEMBL5807045 0.81 CYP1A2 (0.59) HTTMEN1KMT2APKMCYP1A2
SCHEMBL6749100 0.81 CYP1A2 (0.59) HTTMEN1KMT2APKMCYP1A2
SCHEMBL1847927 0.81 CYP1A2 (0.59) HTTMEN1KMT2APKMCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6713612-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-03-30 US disclosed
US-20030224298-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030224298-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, DNMT3A, PIM3 HTT 2715/4885MEN1 3540/4885KMT2A 1111/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.