Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Nitric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Nitric Acid SCHEMBL4217882 | 1.00 | CA5A (0.80) | — | |
| Nitric Acid SCHEMBL28264547 | 0.95 | — | — | |
| Nitric Acid SCHEMBL11649686 | 0.95 | CA5A (0.89) | — | |
| Nitric Acid SCHEMBL21523563 | 0.95 | CA5A (0.89) | — | |
| Nitric Acid SCHEMBL6346653 | 0.95 | — | — | |
| Nitric Acid SCHEMBL8510743 | 0.95 | CA5A (0.89) | — | |
| Nitric Acid SCHEMBL1943526 | 0.95 | — | — | |
| Nitric Acid SCHEMBL479716 | 0.95 | — | — | |
| Nitric Acid SCHEMBL228897 | 0.95 | CA5A (0.89) | — | |
| Nitric Acid SCHEMBL19616567 | 0.95 | CA5A (0.89) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026086760-A1 | ABSORBENT ARTICLE HAVING ANTIBACTERIAL FUNCTION FOR WOMEN | 金佰利（中国）有限公司 | 2026-04-30 | — | — | WO | disclosed |
| CN-116162282-A | Antibacterial and antiviral structure | 京程科技股份有限公司 | 2023-05-26 | — | — | CN | disclosed |
| WO-2013075221-A1 | COMPOSITIONS AND METHODS FOR TREATING PLANT INFECTIONS BY USING HIGH VALENCY SILVER COMPOUNDS | INNOVOTECH, INC. (CA) | 2013-05-30 | — | — | WO | disclosed |
| US-20110275518-A1 | Compositions and Methods Comprising High Valency Silver for Increasing Seed Germination | MARQUES LYRIAM L | 2011-11-10 | — | — | US | disclosed |
| US-7767115-B2 | Metal particle dispersion liquid, method for manufacturing metal particle dispersion liquid, method for manufacturing conductive-film-forming substrate, electronic device and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2010-08-03 | — | — | US | disclosed |
| EP-2162000-A1 | METHODS AND COMPOSITIONS COMPRISING HIGH VALENCY SILVER FOR INCREASING SEED GERMINATION | Innovotech Inc. (CA) | 2010-03-17 | — | — | EP | disclosed |
| US-20090250667-A1 | Metal particle dispersion liquid, method for manufacturing metal particle dispersion liquid, method for manufacturing conductive-film-forming substrate, electronic device and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2009-10-08 | — | — | US | disclosed |
| US-7560051-B2 | Metal particle dispersion liquid, method for manufacturing metal particle dispersion liquid, method for manufacturing conductive-film-forming substrate, electronic device and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2009-07-14 | — | — | US | disclosed |
| WO-2008148221-A1 | METHODS AND COMPOSITIONS COMPRISING HIGH VALENCY SILVER FOR INCREASING SEED GERMINATION | INNOVOTECH INC. (CA) | 2008-12-11 | — | — | WO | disclosed |
| US-20060210815-A1 | Metal particle dispersion liquid, method for manufacturing metal particle dispersion liquid, method for manufacturing conductive-film-forming substrate, electronic device and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2006-09-21 | — | — | US | disclosed |