Acrylic Acid

Acrylic Acid

SCHEMBL6757388

C=CC(=O)O.FOC(F)(F)C1(F)C(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.30

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17222847 0.64
SCHEMBL11970100 0.61
Acrylic Acid SCHEMBL9159882 0.60 LMNA (0.71) LMNA
Acrylic Acid SCHEMBL15881910 0.60
Acrylic Acid SCHEMBL1726999 0.60 LMNA (0.71) LMNA
Acrylic Acid SCHEMBL7062904 0.60 LMNA (0.71) LMNA
SCHEMBL4645114 0.59 TSHR (0.32)
Acrylic Acid SCHEMBL27405575 0.58
Acrylic Acid SCHEMBL28094417 0.58 LMNA (0.67) LMNA
Acrylic Acid SCHEMBL184247 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6723485-B1 HEXAFLUOROISOPROPYL (METH)ACRYLATE RESIN AND PHOTOACID GENERATOR; LASER HAVING WAVELENGTH IN VACUUM ULTRAVIOLET REGION CENTRAL GLASS COMPANY, LIMITED (JP) 2004-04-20 US disclosed
EP-1103856-A1 Positive resist composition & process for forming resist pattern using same Central Glass Company, Limited (JP) 2001-05-30 EP disclosed