SCHEMBL6758591

SCHEMBL6758591

CC(C)c1cccc(COCc2cccc(C(C)C)c2C(C)C)c1C(C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 4/20 0.41
GABRG2 P18507 2/20 0.41
GABRB3 P28472 2/20 0.41
GABRB2 P47870 3/20 0.40
CYP1A2 P05177 2/20 0.40
CYP3A4 P08684 2/20 0.40
TSHR P16473 2/20 0.40
FAAH O00519 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
LMNA P02545 1/20 0.40
HPGD P15428 1/20 0.40
GABRB1 P18505 1/20 0.40
PTGS1 P23219 1/20 0.40
SLC6A2 P23975 1/20 0.40
HTR2C P28335 1/20 0.40
GABRA5 P31644 1/20 0.40
GABRA3 P34903 1/20 0.40
HTR2B P41595 1/20 0.40
GABRA2 P47869 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL487530 0.88 GABRA1 (0.41) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL704039 0.85 GABRA1 (0.38) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL5191030 0.85 GABRA1 (0.42) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL7771649 0.81 GABRA1 (0.43) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL3088973 0.79 GABRA1 (0.43) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL10349024 0.78 GABRA1 (0.42) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL487534 0.78 GABRA1 (0.57) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL676937 0.78 GABRA1 (0.42) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL10397566 0.76 GABRA1 (0.41) GABRA1GABRG2GABRB3GABRB2CYP1A2
SCHEMBL21056164 0.76 GABRA1 (0.41) GABRA1GABRG2GABRB3GABRB2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6828070-B2 Heat sensitive element FUJI PHOTO FILM CO., LTD. (JP) 2004-12-07 US disclosed
US-20020015903-A1 Photosensitive material comprising reversibly decolorable colored layer and image-forming method using same FUJI PHOTO FILM CO., LTD. 2002-02-07 US disclosed