Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.34 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.32 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.32 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.32 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.32 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.32 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.32 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | SLC22A2 | O15244 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | SLC47A1 | Q96FL8 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6849661 | 0.77 | KMT2A (0.39) | NPSR1GAACA12CA2CA7 | |
| SCHEMBL21303165 | 0.74 | — | — | |
| SCHEMBL9001234 | 0.72 | GAA (0.39) | NPSR1GAAGRIN2DGRIN3BGRIN1 | |
| SCHEMBL11585265 | 0.71 | CA12 (0.33) | GAAGLACA12CA2CA7 | |
| SCHEMBL28375490 | 0.71 | GAA (0.42) | NPSR1GAACA12CA2CA7 | |
| SCHEMBL16382363 | 0.70 | CA12 (0.30) | CA12CA2CA7CA9CA14 | |
| SCHEMBL1394052 | 0.70 | NPSR1 (0.31) | NPSR1GAAGLACA12CA2 | |
| SCHEMBL27831176 | 0.69 | GAA (0.33) | NPSR1GAAGLACA12CA2 | |
| SCHEMBL13069802 | 0.68 | GAA (0.36) | NPSR1GAAGRIN2DGRIN3BGRIN1 | |
| SCHEMBL27651990 | 0.67 | GRIN2D (0.42) | CA12CA2CA7CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6461417-B1 | Ink compositions | XEROX CORPORATION | 2002-10-08 | — | — | US | claimed |
| CN-111712551-A | Preparation of organic functional material | 默克专利有限公司 | 2020-09-25 | — | — | CN | disclosed |
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | US | disclosed |
| WO-2010035905-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | WO | disclosed |
| US-7611819-B2 | Comprising an alicyclic compound and a resin wherein the alicyclic compound is an adamantane compound or norbornane compound; for interconnection pattern with fine, precise, and accurate dimensions | FUJITSU LIMITED (JP) | 2009-11-03 | — | — | US | disclosed |
| US-7611819-B2 | Comprising an alicyclic compound and a resin wherein the alicyclic compound is an adamantane compound or norbornane compound; for interconnection pattern with fine, precise, and accurate dimensions | FUJITSU LIMITED (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20070224537-A1 | Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224537-A1 | Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| US-6797745-B1 | Hot melt inks containing styrene or terpene polymers | XEROX CORPORATION | 2004-09-28 | — | — | US | disclosed |
| US-6461417-B1 | Ink compositions | XEROX CORPORATION | 2002-10-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | ARSA, RAD51, ARID2 | NPSR1 1850/4885GAA 3220/4885GLA 559/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.