Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM2 | Q14416 | 2/20 | 0.31 |
| ▸ | GRM3 | Q14832 | 2/20 | 0.31 |
| ▸ | GRM4 | Q14833 | 2/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | GRM8 | O00222 | 1/20 | 0.31 |
| ▸ | GRM6 | O15303 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GRM5 | P41594 | 1/20 | 0.31 |
| ▸ | MTOR | P42345 | 1/20 | 0.31 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.31 |
| ▸ | PLCB1 | Q9NQ66 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15440894 | 0.86 | ALDH1A1 (0.34) | — | |
| SCHEMBL5318288 | 0.86 | ALDH1A1 (0.34) | — | |
| SCHEMBL15440623 | 0.83 | GRM4 (0.37) | GRM2GRM3GRM4CYP1A2ALOX15 | |
| SCHEMBL76019 | 0.83 | GRM4 (0.37) | GRM2GRM3GRM4CYP1A2ALOX15 | |
| SCHEMBL10277256 | 0.81 | GRM4 (0.36) | GRM2GRM3GRM4CYP1A2ALOX15 | |
| SCHEMBL30199518 | 0.81 | GRM4 (0.36) | GRM2GRM3GRM4CYP1A2ALOX15 | |
| SCHEMBL28770911 | 0.81 | GRM4 (0.36) | GRM2GRM3GRM4CYP1A2ALOX15 | |
| Hydrochloric Acid SCHEMBL3688896 | 0.81 | GRM4 (0.36) | GRM2GRM3GRM4CYP1A2ALOX15 | |
| Hydrochloric Acid SCHEMBL4196175 | 0.81 | GRM4 (0.36) | GRM2GRM3GRM4CYP1A2ALOX15 | |
| SCHEMBL27607943 | 0.80 | GRM4 (0.35) | GRM2GRM3GRM4CYP1A2ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2754693-B1 | EMBEDDING RESIN COMPOSITION FOR ELECTRON MICROSCOPE, AND METHOD FOR OBSERVING SAMPLE ON ELECTRON MICROSCOPE USING SAID COMPOSITION | UNIV KURUME (JP) | 2018-11-14 | — | — | EP | disclosed |
| US-9870894-B2 | Embedding resin composition for electron microscopey and method for observing sample with electron microscope using the same | KURUME UNIVERSITY (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9034661-B2 | Method for producing molecule immobilizing substrate, and molecule immobilizing substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20140212913-A1 | EMBEDDING RESIN COMPOSITION FOR ELECTRON MICROSCOPE, AND METHOD FOR OBSERVING SAMPLE ON ELECTRON MICROSCOPE USING SAID COMPOSITION | KURUME UNIVERSITY (JP) | 2014-07-31 | — | — | US | disclosed |
| US-8421113-B2 | Electronic device incorporating the white resin | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8367153-B2 | Method of using white resin in an electronic device | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8343616-B2 | Coating agent, substrate for mounting optical semiconductor element using same, and optical semiconductor device | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8334088-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-20110284915-A1 | Electronic device incorporating the white resin | HITACHI CHEMICAL COMPANY, LTD. | 2011-11-24 | — | — | US | disclosed |
| US-20110278630-A1 | COATING AGENT, SUBSTRATE FOR MOUNTING OPTICAL SEMICONDUCTOR ELEMENT USING SAME, AND OPTICAL SEMICONDUCTOR DEVICE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-11-17 | — | — | US | disclosed |
| US-20110045407-A1 | Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| US-7883828-B2 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-08 | — | — | US | disclosed |
| US-20100279230-A1 | PRODUCTION METHOD OF LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD | MITSUMOTO TOMOYOSHI | 2010-11-04 | — | — | US | disclosed |
| US-7824845-B2 | Functionalized carbosilane polymers and photoresist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-02 | — | — | US | disclosed |
| US-20100233827-A1 | METHOD FOR PRODUCING MOLECULE IMMOBILIZING SUBSTRATE, AND MOLECULE IMMOBILIZING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20090081598-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081597-A1 | generating a resist image with polycarbosilanes as acid generator, having acid labile functionality; high refractive index (n>1.7) and absorbance at 193 nm that is relatively low (A<3.00 mu m-1); aqueous base soluble; suitable for use immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081579-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081585-A1 | FUNCTIONALIZED CARBOSILANE POLYMERS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| EP-1630618-B1 | Method for producing a lithographic printing plate | FUJIFILM CORP (JP) | 2008-03-19 | — | — | EP | disclosed |