Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.43 |
| ▸ | HRH3 | Q9Y5N1 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | HRH1 | P35367 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.38 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.37 |
| ▸ | FURIN | P09958 | 2/20 | 0.37 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.37 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.37 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.37 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.37 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.37 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.37 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.37 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2924302 | 1.00 | PARP10 (0.43) | PARP10HRH3HPGDALDH1A1TSHR | |
| SCHEMBL22392 | 1.00 | PARP10 (0.43) | PARP10HRH3HPGDALDH1A1TSHR | |
| SCHEMBL27560412 | 0.98 | PARP10 (0.42) | PARP10HRH3HPGDALDH1A1TSHR | |
| SCHEMBL21281 | 0.98 | PARP10 (0.44) | PARP10HRH3HPGDALDH1A1TSHR | |
| SCHEMBL231982 | 0.93 | PARP10 (0.48) | PARP10HRH3HPGDALDH1A1TSHR | |
| SCHEMBL6529789 | 0.91 | PARP10 (0.41) | PARP10HRH3HPGDALDH1A1TSHR | |
| SCHEMBL333383 | 0.89 | HRH1 (0.43) | PARP10HRH3ALDH1A1TSHRHRH1 | |
| SCHEMBL4353074 | 0.84 | PARP10 (0.39) | PARP10HRH3HPGDALDH1A1TSHR | |
| SCHEMBL14775243 | 0.84 | HRH1 (0.56) | PARP10HRH3HRH1 | |
| SCHEMBL2242868 | 0.84 | PARP10 (0.55) | PARP10HRH3HPGDALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| EP-2570418-A2 | 2,3-dihydro-6-nitroimidazo[2,1-b]oxazoles compound | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2013-03-20 | — | — | EP | disclosed |
| EP-1555267-B1 | 2,3-DIHYDRO-6-NITROIMIDAZO[2,1-b]OXAZOLES | OTSUKA PHARMA CO LTD (JP) | 2013-01-16 | — | — | EP | disclosed |
| EP-1367439-B1 | Radiation-sensitive composition | FUJIFILM CORP (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| EP-2399168-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM Corporation (JP) | 2011-12-28 | — | — | EP | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| EP-1465010-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-7374860-B2 | Positive resist composition and pattern forming method using the same | FUJI FILM CORPORATION (JP) | 2008-05-20 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-4140681-A | ANTICOAGULANTS | MITSUBISHI CHEMICAL INDUSTRIES, LIMITED (JP) | 1979-02-20 | — | — | US | disclosed |
| US-4131673-A | INHIBITION AND SUPPRESSION OF THROMBOSIS IN MAMMALS | MITSUBISHI CHEMICAL INDUSTRIES, LIMITED (JP) | 1978-12-26 | — | — | US | disclosed |
| US-4125604-A | PEPTIDES, ANTITHROMBOSIS | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1978-11-14 | — | — | US | disclosed |
| US-4097591-A | ANTITHROMBOSIS | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JA) | 1978-06-27 | — | — | US | disclosed |