Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.30 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.30 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.30 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL677864 | 0.83 | KMT2A (0.32) | HSD11B1KMT2ASMN1; SMN2EPHX2MEN1 | |
| Ammonia Solution, Strong SCHEMBL11634583 | 0.82 | EPHX2 (0.31) | HSD11B1KMT2AEPHX2MEN1 | |
| SCHEMBL1592795 | 0.80 | GRIN2D (0.31) | ALDH1A1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL4892833 | 0.78 | ALDH1A1 (0.33) | HSD11B1KMT2AALDH1A1EPHX2MEN1 | |
| SCHEMBL27860770 | 0.77 | EPHX2 (0.41) | ALDH1A1EPHX2 | |
| SCHEMBL27843231 | 0.77 | EPHX2 (0.41) | ALDH1A1EPHX2 | |
| SCHEMBL7263732 | 0.76 | GRIN2D (0.31) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL11637141 | 0.75 | SLC22A2 (0.39) | KMT2AALDH1A1EPHX2 | |
| SCHEMBL1071740 | 0.74 | GRIN2D (0.31) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL6291331 | 0.74 | NPSR1 (0.33) | HSD11B1KMT2ASMN1; SMN2ALDH1A1GRIN2D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114560768-B | Synthesis method of acrylic resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2024-03-15 | — | — | CN | claimed |
| CN-114560768-A | Synthesis method of acrylate resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2022-05-31 | — | — | CN | claimed |
| CN-114637165-B | Composition for photoresist top layer coating and polymer preparation method thereof | 中节能万润股份有限公司 | 2024-09-17 | — | — | CN | disclosed |
| CN-114560768-B | Synthesis method of acrylic resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2024-03-15 | — | — | CN | disclosed |
| CN-117623918-A | Preparation method of acrylic resin monomer for 193nm photoresist | 河北凯力昂生物科技有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-114637165-A | Composition for top coating of photoresist and preparation method of polymer of composition | 中节能万润股份有限公司 | 2022-06-17 | — | — | CN | disclosed |
| CN-114560768-A | Synthesis method of acrylate resin monomer for 193nm photoresist | 河北凯诺中星科技有限公司 | 2022-05-31 | — | — | CN | disclosed |
| EP-2333135-B1 | RUST INHIBITOR AND SURFACE-TREATED METAL MATERIAL | AUTONETWORKS TECHNOLOGIES LTD (JP) | 2018-01-03 | — | — | EP | disclosed |
| EP-2325695-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| US-9348226-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-20060074139-A1 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1602975-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-12-07 | — | — | EP | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| EP-0793656-A1 | NOVEL BENZYL PYRIMIDINES | F. HOFFMANN-LA ROCHE AG (CH) | 1997-09-10 | — | — | EP | disclosed |
| WO-1996016046-A2 | NOVEL BENZYL PYRIMIDINES | F. HOFFMANN-LA ROCHE AG (CH) | 1996-05-30 | — | — | WO | disclosed |
| EP-0270709-B1 | PROCESS FOR THE PRODUCTION OF VINYL POLYMERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-02-06 | — | — | EP | disclosed |