Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 3/20 | 0.56 |
| ▸ | GABRB2 | P47870 | 3/20 | 0.56 |
| ▸ | ELANE | P08246 | 1/20 | 0.33 |
| ▸ | CTSG | P08311 | 1/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.32 |
| ▸ | MAOA | P21397 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.32 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | CDK1 | P06493 | 1/20 | 0.30 |
| ▸ | CDK2 | P24941 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29249256 | 0.84 | GABRA1 (0.58) | GABRA1GABRB2ELANECTSGSLC6A2 | |
| SCHEMBL954574 | 0.80 | GABRA1 (0.54) | GABRA1GABRB2ELANECTSGTAAR1 | |
| SCHEMBL2922173 | 0.78 | GABRA1 (0.38) | GABRA1GABRB2SLC6A2SIGMAR1SLC6A4 | |
| SCHEMBL2921819 | 0.76 | GABRA1 (0.48) | GABRA1GABRB2SLC6A2TAAR1SIGMAR1 | |
| SCHEMBL953300 | 0.75 | GABRA1 (0.48) | GABRA1GABRB2ELANECTSG | |
| SCHEMBL677034 | 0.75 | GABRA1 (0.48) | GABRA1GABRB2 | |
| SCHEMBL952740 | 0.75 | GABRA1 (0.53) | GABRA1GABRB2ELANECTSGCDK1 | |
| SCHEMBL840750 | 0.75 | GABRA1 (0.64) | GABRA1GABRB2SLC6A2TAAR1SIGMAR1 | |
| SCHEMBL23527437 | 0.73 | GABRA1 (0.62) | GABRA1GABRB2SLC6A2TAAR1SIGMAR1 | |
| SCHEMBL2743774 | 0.73 | GABRA1 (0.62) | GABRA1GABRB2ELANECTSGSLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| EP-1367439-B1 | Radiation-sensitive composition | FUJIFILM CORP (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| EP-2399168-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM Corporation (JP) | 2011-12-28 | — | — | EP | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| EP-1465010-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2009-10-21 | — | — | EP | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| US-7250246-B2 | Positive resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2007-07-31 | — | — | US | disclosed |
| EP-1557720-A1 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-07-27 | — | — | EP | disclosed |
| EP-1467251-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040197702-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| EP-1465010-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-06 | — | — | EP | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |