Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 4/20 | 0.52 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.45 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.40 |
| ▸ | BACE1 | P56817 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8674414 | 1.00 | IDO1 (0.52) | IDO1CHRNB4CHRNA3GAAL3MBTL1 | |
| SCHEMBL15873681 | 0.90 | GAA (0.50) | IDO1CHRNB4CHRNA3GAAL3MBTL1 | |
| SCHEMBL6650399 | 0.90 | GAA (0.55) | IDO1CHRNB4CHRNA3GAAL3MBTL1 | |
| SCHEMBL14415621 | 0.89 | IDO1 (0.48) | IDO1CHRNB4CHRNA3GAAL3MBTL1 | |
| SCHEMBL11470260 | 0.89 | KCNA3 (0.44) | IDO1CHRNB4CHRNA3GAAL3MBTL1 | |
| SCHEMBL1248051 | 0.87 | IDO1 (0.57) | IDO1GAAL3MBTL1 | |
| SCHEMBL2247018 | 0.84 | OPRD1 (0.57) | OPRD1 | |
| SCHEMBL4674804 | 0.84 | IDO1 (0.39) | IDO1CHRNB4CHRNA3GAAL3MBTL1 | |
| SCHEMBL14620946 | 0.83 | IDO1 (0.44) | IDO1GAAL3MBTL1OPRD1CYP2D6 | |
| Hydrochloric Acid SCHEMBL3657538 | 0.82 | OPRD1 (0.56) | OPRD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| EP-2399168-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM Corporation (JP) | 2011-12-28 | — | — | EP | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| EP-0897130-B1 | Thermographic recording element | FUJIFILM CORP (JP) | 2009-07-15 | — | — | EP | disclosed |
| EP-1020760-B1 | Heat developable image recording material | FUJIFILM CORP (JP) | 2007-11-14 | — | — | EP | disclosed |
| EP-0974866-B1 | Heat-developable image-recording material | FUJI PHOTO FILM CO LTD (JP) | 2006-10-18 | — | — | EP | disclosed |
| US-6987174-B2 | Azo compound, colorant-containing curable composition, color filter and color filter production method | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-17 | — | — | US | disclosed |
| EP-1041434-B1 | Heat-developable photosensitive material | FUJI PHOTO FILM CO LTD (JP) | 2005-11-02 | — | — | EP | disclosed |
| EP-1045284-B1 | Heat developing method for heat developable image recording material | FUJI PHOTO FILM CO LTD (JP) | 2005-07-06 | — | — | EP | disclosed |
| EP-0834767-B1 | Photothermographic material | FUJI PHOTO FILM CO LTD (JP) | 2000-04-05 | — | — | EP | disclosed |
| US-6027872-A | SUPPORT COATED WITH PHOTOSENSITIVE SILVER HALIDE, ORGANIC SILVER SALT, REDUCING AGENT AND A DISULFIDE COMPOUND FOR IMPROVED INFRARED SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-02-22 | — | — | US | disclosed |
| US-6025122-A | MATERIAL COMPRISING REDUCIBLE SILVER SALT, REDUCING AGENT, CONTRAST ENHANCER, BINDER, THIOSULFONIC ACID OR ESTER COMPOUND; ULTRAHIGH CONTRAST, LOW FOG, MINIMIZED VARIATION OF PHOTOGRAPHIC CHARACTERISTICS WITH HEAT DEVELOPMENT | FUJI PHOTO FILM CO., LTD. (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0974866-A1 | Heat-developable image-recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2000-01-26 | — | — | EP | disclosed |
| EP-0957398-A1 | Thermographic recording element | FUJI PHOTO FILM CO., LTD. (JP) | 1999-11-17 | — | — | EP | disclosed |
| US-5962212-A | ORGANIC ACID SILVER SALT, A REDUCING AGENT, A SPECIFIC HYDRAZINE DERIVATIVE, AND OPTIONALLY, A PHOTOSENSITIVE SILVER HALIDE IS IMPROVED IN STORAGE STABILITY AND FORMS IMAGES HAVING HIGH DMAX. | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0902322-A1 | Thermographic image-recording elements | FUJI PHOTO FILM CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0897130-A1 | Thermographic recording element | FUJI PHOTO FILM CO., LTD. (JP) | 1999-02-17 | — | — | EP | disclosed |
| EP-0869391-A1 | Heat-developable photographic materials | FUJI PHOTO FILM CO., LTD. (JP) | 1998-10-07 | — | — | EP | disclosed |
| EP-0834767-A1 | Photothermographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-04-08 | — | — | EP | disclosed |