Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.58 |
| ▸ | THRA | P10827 | 1/20 | 0.47 |
| ▸ | THRB | P10828 | 1/20 | 0.47 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.47 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.47 |
| ▸ | BID | P55957 | 3/20 | 0.45 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.45 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.45 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.45 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.45 |
| ▸ | PPARG | P37231 | 1/20 | 0.45 |
| ▸ | PPARA | Q07869 | 1/20 | 0.45 |
| ▸ | EP300 | Q09472 | 1/20 | 0.45 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.45 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.45 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.45 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.45 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.44 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.43 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL667814 | 1.00 | LIPG (0.58) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL9386103 | 1.00 | LIPG (0.58) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL2919197 | 1.00 | LIPG (0.58) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL677130 | 0.98 | LIPG (0.55) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL482780 | 0.91 | LIPG (0.47) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL11393854 | 0.91 | LIPG (0.67) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL269513 | 0.89 | LIPG (0.69) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL3849327 | 0.89 | LIPG (0.69) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL10758354 | 0.89 | LIPG (0.69) | LIPGTHRATHRBNR1H2NR1H3 | |
| SCHEMBL271030 | 0.89 | LIPG (0.69) | LIPGTHRATHRBNR1H2NR1H3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11718758-B2 | Aqueous dispersion of colored particles | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2023-08-08 | — | — | US | disclosed |
| EP-3725854-B1 | COLORED PARTICLE AQUEOUS DISPERSION | MITSUBISHI PENCIL CO (JP) | 2023-07-05 | — | — | EP | disclosed |
| CN-111465662-B | Aqueous dispersion of coloured particles | 三菱铅笔株式会社 | 2023-05-26 | — | — | CN | disclosed |
| WO-2021241484-A1 | WRITING IMPLEMENT | 三菱鉛筆株式会社 | 2021-12-02 | — | — | WO | disclosed |
| US-20210071006-A1 | AQUEOUS DISPERSION OF COLORED PARTICLES | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2021-03-11 | — | — | US | disclosed |
| CN-108473784-B | Polyfunctional polymerizable compound and coloring composition | 富士胶片和光纯药株式会社 | 2021-01-12 | — | — | CN | disclosed |
| EP-3725854-A1 | COLORED PARTICLE AQUEOUS DISPERSION | MITSUBISHI PENCIL COMPANY, LIMITED (JP) | 2020-10-21 | — | — | EP | disclosed |
| CN-111465662-A | Aqueous dispersions of pigmented particles | 三菱铅笔株式会社 | 2020-07-28 | — | — | CN | disclosed |
| EP-3444304-A1 | POLYFUNCTIONAL POLYMERIZABLE COMPOUND AND COLORED COMPOSITION | FUJIFILM Wako Pure Chemical Corporation (JP) | 2019-02-20 | — | — | EP | disclosed |
| US-9206371-B2 | Bearing grease | IDEMITSU KOSAN CO., LTD. (JP) | 2015-12-08 | — | — | US | disclosed |
| US-6743565-B2 | POLYSTYRENE OXY DERIVATIVES THAT DECOMPOSE UNDER AN ACID TO INCREASE THE SOLUBILITY IN AN ALKALI DEVELOPER AND AN ACID GENERATOR | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-6727033-B2 | A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN | FUJI PHOTO FILM CO., LTD. (JP) | 2004-04-27 | — | — | US | disclosed |
| US-20040033437-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-02-19 | — | — | US | disclosed |
| US-6692883-B2 | GENERATING ACID; ADJUSTMENT SOLUBILITY IN ALKLAINE DEVELOPER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1367439-A1 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-12-03 | — | — | EP | disclosed |
| US-6630280-B1 | Resin and compound that generates an arylsulfonic acid when exposed to actinic radiation; sensitivity; resolution; smoothness | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-07 | — | — | US | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-6207343-B1 | RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |