Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 4/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 4/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.42 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.41 |
| ▸ | NR5A1 | Q13285 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL677039 | 0.93 | TSHR (0.46) | LTA4HCYP2C9CYP2C19CYP1A2CYP3A4 | |
| SCHEMBL1451918 | 0.91 | TSHR (0.49) | LTA4HCYP3A4NR5A1TSHRMCHR1 | |
| SCHEMBL3597737 | 0.91 | TSHR (0.49) | LTA4HCYP3A4NR5A1TSHRMCHR1 | |
| SCHEMBL5983957 | 0.91 | TSHR (0.49) | LTA4HCYP3A4NR5A1TSHRMCHR1 | |
| SCHEMBL185541 | 0.88 | KMT2A (0.39) | LTA4HTSHRSMN1; SMN2MCHR1KDM4E | |
| SCHEMBL27660871 | 0.88 | LTA4H (0.40) | LTA4HCYP2C9CYP2C19CYP1A2CYP2D6 | |
| SCHEMBL160079 | 0.86 | LTA4H (0.39) | LTA4HCYP2C9CYP2C19CYP1A2CYP2D6 | |
| SCHEMBL11589552 | 0.86 | SMN1; SMN2 (0.41) | LTA4HCYP3A4NR5A1TSHRSMN1; SMN2 | |
| SCHEMBL27581574 | 0.86 | LTA4H (0.42) | LTA4HCYP2C9CYP2C19CYP1A2CYP2D6 | |
| SCHEMBL27680868 | 0.86 | LTA4H (0.39) | LTA4HCYP2C9CYP2C19CYP1A2CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9235117-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| CN-102816130-B | Thiazole compound and use thereof | OTSUKA PHARMA CO LTD | 2015-05-06 | — | — | CN | disclosed |
| EP-2864839-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2015-04-29 | — | — | EP | disclosed |
| US-20150079508-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-19 | — | — | US | disclosed |
| CN-104335119-A | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device | FUJIFILM CORP | 2015-02-04 | — | — | CN | disclosed |
| WO-2013176294-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-11-28 | — | — | WO | disclosed |
| US-8450352-B2 | Thiazole compounds and their use for inhibiting phosphodiesterase 4, TNF-α, and IL-4 | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| CN-102816130-A | Thiazole Compound and Use Thereof | OTSUKA PHARMA CO LTD | 2012-12-12 | — | — | CN | disclosed |
| CN-1953968-B | Thiazole compounds and uses thereof | OTSUKA PHARMA CO LTD | 2012-10-10 | — | — | CN | disclosed |
| US-20030134221-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| US-20030108811-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20020012866-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-0882768-B1 | Method for producing of phthalocyanine compound | NIPPON CATALYTIC CHEM IND (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-6207343-B1 | RESIN CONTAINING GROUPS WHICH DECOMPOSE BY THE ACTION OF AN ACID TO ENHANCE ITS SOLUBILITY IN AN ALKALINE DEVELOPING SOLUTION AND A COMPOUND WHICH GENERATES AN ACID UPON IRRADIATION WITH ACTINIC RAYS OR RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6034236-A | REACTING A PHTHALONITRILE WITH A METAL OXIDE IN PRESENCE OF A SULFONIC ACID CATALYST | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| US-5998609-A | OPTICAL RECORDING MEDIA | NIPPON SHOKUBAI CO., LTD. (JP) | 1999-12-07 | — | — | US | disclosed |
| EP-0889097-A1 | PHTHALOCYANINE COMPOUNDS, PROCESS FOR PREPARING THE SAME, AND OPTICAL RECORDING MEDIUM MADE USING THE SAME | NIPPON SHOKUBAI CO., LTD. (JP) | 1999-01-07 | — | — | EP | disclosed |
| EP-0882768-A2 | Method for producing of phthalocyanine compound | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-12-09 | — | — | EP | disclosed |
| US-4169106-A | Antiarrhythmic N,N'-bis(phenylcarbamoylalkyl)amidines | COOPER LABORATORIES, INC. (US) | 1979-09-25 | — | — | US | disclosed |