SCHEMBL678638

SCHEMBL678638

[CH2]C(=O)C(=C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3994531 0.81
SCHEMBL176351 0.78
SCHEMBL27725924 0.76
SCHEMBL16063 0.76
SCHEMBL8810584 0.76
SCHEMBL8835058 0.76
Methacrylic Acid SCHEMBL28306181 0.75 TDP1 (0.47)
Methacrylic Acid SCHEMBL28486973 0.75 CA4 (0.53)
SCHEMBL29380 0.75
Methacrylic Acid SCHEMBL491341 0.73 TDP1 (0.53)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 311 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11022884-B2 Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-06-01 US claimed
CN-104086580-A Acryl multi-arm silane coupling agent and preparation method thereof UNIV SHANDONG 2014-10-08 CN claimed
CN-102300550-A Perfume systems 2011-12-28 CN claimed
EP-1675558-A1 COSMETIC COMPOSITION COMPRISING A TENSIONING AGENT AND A PARTICULAR BLOCK ETHYLENIC POLYMER L'OREAL (FR) 2006-07-05 EP claimed
CN-1258468-C Child-resistant safety closure AIRSEC S A (FR) 2006-06-07 CN claimed
WO-2005030158-A1 COSMETIC COMPOSITION COMPRISING A TENSIONING AGENT AND A PARTICULAR BLOCK ETHYLENIC POLYMER L'OREAL (FR) 2005-04-07 WO claimed
CN-1478040-A Child-resistant safety lockout mechanism 2004-02-25 CN claimed
EP-1027378-A1 DURABLE, FILM-FORMING, WATER-DISPERSIVE POLYMERS Hewlett-Packard Company (US) 2000-08-16 EP claimed
EP-1027393-A1 PRINTING INK COMPOSITIONS HAVING SUPERIOR SMEAR-FASTNESS Hewlett-Packard Company (US) 2000-08-16 EP claimed
WO-1999023183-A1 PRINTING INK COMPOSITIONS HAVING SUPERIOR SMEAR-FASTNESS HEWLETT-PACKARD COMPANY (US) 1999-05-14 WO claimed
WO-1999023126-A1 DURABLE, FILM-FORMING, WATER-DISPERSIVE POLYMERS HEWLETT-PACKARD COMPANY (US) 1999-05-14 WO claimed
JP-6118237-A None JP disclosed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
CN-118159910-A Additive-containing silicon-containing resist underlayer film forming composition 日产化学株式会社 2024-06-07 CN disclosed
WO-1989012667-A1 LUBRICATING OIL COMPOSITIONS AND CONCENTRATES THE LUBRIZOL CORPORATION (US) 1989-12-28 WO disclosed
US-4886891-A Process for preparing 1,1-disubstituted ethylene derivative by reaction of lead with a carbinol derivative OTSUKA KAGAKU KABUSHIKI KAISHA (JP) 1989-12-12 US disclosed
EP-0275528-A1 Process for preparing 1,1-disubstituted ethylene derivative Otsuka Kagaku Kabushiki Kaisha (JP) 1988-07-27 EP disclosed
US-4657976-A Moulding compositions of vinyl chloride polymers, graft polymers and polymeric plasticizers having a high resistance to ageing BAYER AKTIENGESELLSCHAFT (DE) 1987-04-14 US disclosed
EP-0063817-A1 Metallic base paint KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1982-11-03 EP disclosed