⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6924228 | 0.71 | — | — | |
| SCHEMBL16717686 | 0.68 | — | — | |
| SCHEMBL11272359 | 0.64 | — | — | |
| SCHEMBL15772320 | 0.63 | — | — | |
| SCHEMBL10718790 | 0.63 | — | — | |
| SCHEMBL18818440 | 0.59 | — | — | |
| SCHEMBL8177787 | 0.58 | — | — | |
| SCHEMBL9188085 | 0.58 | — | — | |
| SCHEMBL8083144 | 0.56 | — | — | |
| SCHEMBL404337 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112639614-B | Water-developable flexographic printing plate precursor, flexographic printing plate and photosensitive resin composition | 富士胶片株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-109476797-B | Block copolymer, composition and film | 大塚化学株式会社 | 2021-09-07 | — | — | CN | disclosed |
| EP-3842862-A1 | WATER-DEVELOPABLE FLEXO PRINTING PLATE ORIGINAL PLATE, FLEXO PRINTING PLATE, AND PHOTOSENSITIVE RESIN COMPOSITION | FUJIFILM Corporation (JP) | 2021-06-30 | — | — | EP | disclosed |
| US-20210165322-A1 | WATER-DEVELOPABLE FLEXOGRAPHIC PRINTING PLATE PRECURSOR, FLEXOGRAPHIC PRINTING PLATE, AND PHOTOSENSITIVE RESIN COMPOSITION | FUJIFILM CORPORATION (JP) | 2021-06-03 | — | — | US | disclosed |
| CN-112639614-A | Water-developable flexographic printing plate precursor, flexographic printing plate, and photosensitive resin composition | 富士胶片株式会社 | 2021-04-09 | — | — | CN | disclosed |
| EP-2463316-B1 | ACRYLATE COMPOSITION | IDEMITSU KOSAN CO (JP) | 2016-06-08 | — | — | EP | disclosed |
| EP-2634199-B1 | (METH)ACRYLATE COMPOSITION | IDEMITSU KOSAN CO (JP) | 2016-03-16 | — | — | EP | disclosed |
| US-20150322233-A1 | (METH)ACRYLATE COMPOSITION | IDEMITSU KOSAN CO. LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-8648160-B2 | Optical semiconductor sealing material | IDEMITSU KOSAN CO., LTD. (JP) | 2014-02-11 | — | — | US | disclosed |
| EP-2163566-B1 | RESIN FOR OPTICAL COMPONENT, RAW MATERIAL COMPOSITION USED FOR RESIN FOR OPTICAL COMPONENT, AND OPTICAL COMPONENT | IDEMITSU KOSAN CO (JP) | 2013-09-18 | — | — | EP | disclosed |
| US-20100324246-A1 | RESIN FOR OPTICAL COMPONENT, RAW MATERIAL COMPOSITION USED FOR RESIN FOR OPTICAL COMPONENT, AND OPTICAL COMPONENT | IDEMITSU KOSAN CO., LTD. (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100234527-A1 | OPTICAL SEMICONDUCTOR ENCAPSULATING MATERIAL | IDEMITSU KOSAN CO., LTD. (JP) | 2010-09-16 | — | — | US | disclosed |
| EP-2163566-A1 | RESIN FOR OPTICAL COMPONENT, RAW MATERIAL COMPOSITION USED FOR RESIN FOR OPTICAL COMPONENT, AND OPTICAL COMPONENT | Idemitsu Kosan Co., Ltd. (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100022733-A1 | (METH)ACRYLATE COPOLYMER FOR SYRUP AND RESIN COMPOSITION THEREOF | IDEMITSU KOSAN CO., LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| EP-2088164-A1 | (METH)ACRYLATE COPOLYMER FOR SYRUP AND RESIN COMPOSITION THEREOF | Idemitsu Kosan Co., Ltd. (JP) | 2009-08-12 | — | — | EP | disclosed |
| US-20080097072-A1 | Optical Semiconductor Sealing Material | IDEMITSU KOSAN CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| US-6515088-B2 | Contacting a mixture of (a) a living free radical initiator having the formula R-(O-O-B-phi 1(- phi 2))n, wherein n is 1-4, R is hydrogen or alkyl or cyclic alkyl, phi 1 and 2 are aryl radical or bridged, and a monomer to produce a polymer | THE PENN STATE RESEARCH FOUNDATION | 2003-02-04 | — | — | US | disclosed |
| US-20020198338-A1 | \"Living\" free radical polymerization process | CHUNG TZE-CHIANG (US) | 2002-12-26 | — | — | US | disclosed |
| US-6420502-B1 | BASED ON ALKYLPEROXYDIARYLBORANE AND DERIVATIVES, SUCH AS 1-ALKYLPEROXY-2,3;5,6-DIBENZOBORINE OR ALKYLPEROXYDIMESITYLBORANE; NARROW MOLECULAR WEIGHT DISTRIBUTION; BLOCK POLYMERS; STAR POLYMERS | THE PENN STATE RESEARCH FOUNDATION | 2002-07-16 | — | — | US | disclosed |
| US-20020091211-A1 | Living free radical initiators based on alkylperoxydiarylborane derivatives and living free radical polymerization process | NAVY, SECRETARY OF THE UNITED STATES OF AMERICA | 2002-07-11 | — | — | US | disclosed |