SCHEMBL679528

SCHEMBL679528

CC(C)C1CCC(O)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6757985 1.00
SCHEMBL8357363 1.00
SCHEMBL6757972 1.00
SCHEMBL6757988 1.00
SCHEMBL13779170 1.00
SCHEMBL13313058 1.00
SCHEMBL12633922 1.00
SCHEMBL6757996 1.00
SCHEMBL19433850 0.85 SHBG (0.37)
SCHEMBL24126295 0.84 DPP4 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119923435-A Polyalkylene carbonate resin composition and method for preparing the same 株式会社LG化学 2025-05-02 CN claimed
CN-119744281-A Polyalkylene carbonate resin composition and method for preparing the same 株式会社LG化学 2025-04-01 CN claimed
CN-117916020-A Double metal cyanide catalysts, methods of preparing the same, and methods of preparing polyalkylene carbonates using the same 株式会社LG化学 2024-04-19 CN claimed
CN-116848175-A Method for preparing polyalkylene carbonate resin 株式会社LG化学 2023-10-03 CN claimed
CN-119923435-A Polyalkylene carbonate resin composition and method for preparing the same 株式会社LG化学 2025-05-02 CN disclosed
CN-119744281-A Polyalkylene carbonate resin composition and method for preparing the same 株式会社LG化学 2025-04-01 CN disclosed
CN-117916020-A Double metal cyanide catalysts, methods of preparing the same, and methods of preparing polyalkylene carbonates using the same 株式会社LG化学 2024-04-19 CN disclosed
US-11826351-B2 Compounds useful as kinase inhibitors LOXO ONCOLOGY INC. (US) 2023-11-28 US disclosed
US-11826351-B2 Compounds useful as kinase inhibitors LOXO ONCOLOGY INC. (US) 2023-11-28 US disclosed
US-20230372298-A1 COMPOUNDS USEFUL AS KINASE INHIBITORS LOXO ONCOLOGY, INC. 2023-11-23 US disclosed
US-20230372298-A1 COMPOUNDS USEFUL AS KINASE INHIBITORS LOXO ONCOLOGY, INC. 2023-11-23 US disclosed
US-20230357179-A1 RAF KINASE INHIBITORS AND METHODS OF USE THEREOF DECIPHERA PHARMACEUTICALS, LLC 2023-11-09 US disclosed
EP-1736829-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-12-27 EP disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
EP-1720064-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2006-11-08 EP disclosed
EP-1710223-A1 PROCESS FOR PRODUCING ALDEHYDE COMPOUND OR KETONE COMPOUND WITH USE OF MICROREACTOR Ube Industries, Ltd. (JP) 2006-10-11 EP disclosed
US-20060223001-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-05 US disclosed
EP-1679314-A1 SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-07-12 EP disclosed
US-20050171226-A1 Radiation sensitive resin composition JSR CORPORATION (JP) 2005-08-04 US disclosed
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed