SCHEMBL679564

SCHEMBL679564

CCN(CC)CC.CN(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trimethylammonium SCHEMBL851475 0.82 ALDH1A1 (0.33)
Hydrazine SCHEMBL8062629 0.82
Methylamine SCHEMBL6868408 0.82
SCHEMBL1736341 0.82 ALDH1A1 (0.40)
SCHEMBL30 0.82
SCHEMBL124190 0.82
Ethylamine SCHEMBL6014208 0.78 PLA2G1B (0.31)
SCHEMBL28553574 0.78
Trimethylammonium SCHEMBL21110533 0.78 ALDH1A1 (0.31)
Methylamine SCHEMBL6886090 0.78 ALDH1A1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103975419-B Plasma activated conformal dielectric film deposition 诺发系统公司 2017-04-12 CN disclosed
US-9611544-B2 Plasma activated conformal dielectric film deposition NOVELLUS SYSTEMS, INC. (US) 2017-04-04 US disclosed
CN-103975419-A Plasma activated conformal dielectric film deposition NOVELLUS SYSTEMS INC 2014-08-06 CN disclosed
WO-2013032786-A2 PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION NOVELLUS SYSTEMS, INC. (US) 2013-03-07 WO disclosed
US-20120009802-A1 PLASMA ACTIVATED CONFORMAL DIELECTRIC FILM DEPOSITION NOVELLUS SYSTEMS, INC. 2012-01-12 US disclosed