⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11131645 | 1.00 | CA12 (0.53) | — | |
| SCHEMBL6016766 | 1.00 | CA12 (0.53) | — | |
| SCHEMBL16616240 | 1.00 | CA12 (0.53) | — | |
| SCHEMBL8852303 | 1.00 | — | — | |
| SCHEMBL4377417 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL28872771 | 0.93 | — | — | |
| SCHEMBL8065129 | 0.91 | CA12 (0.68) | — | |
| SCHEMBL5048294 | 0.86 | — | — | |
| SCHEMBL21357769 | 0.86 | ALOX15 (0.41) | — | |
| SCHEMBL20515421 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107635917-B | Modified amines useful as scale inhibitors in wet-process phosphoric acid production | 塞特工业公司 | 2021-04-30 | — | — | CN | claimed |
| CN-104195602-B | Tight submicrometer structure filling metal plating compositions comprising inhibitor | 巴斯夫欧洲公司 | 2017-05-31 | — | — | CN | claimed |
| CN-106572963-A | Phosphonic copolymer and use thereof in cosmetics field | 莱雅公司 | 2017-04-19 | — | — | CN | claimed |
| CN-103547631-B | Comprise the composition for metal electroplating for the perforation of bottom-up filling silicon and the additive of interconnection part feature | 巴斯夫欧洲公司 | 2016-07-06 | — | — | CN | claimed |
| CN-102365395-B | Metal plating compositions for void-free sub-micron structure fill comprising suppressants | BASF SE | 2015-04-29 | — | — | CN | claimed |
| CN-102365396-B | Composition for metal plating comprising suppressing agent for void free submicron feature filling | BASF SE | 2014-12-31 | — | — | CN | claimed |
| CN-102037051-B | Water-dilutable amines and their use | SIKA TECHNOLOGY AG | 2014-12-24 | — | — | CN | claimed |
| CN-104195602-A | COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING | BASF SE | 2014-12-10 | — | — | CN | claimed |
| CN-102369315-B | Metal plating compositions for void-free sub-micron structure fill comprising suppressants | BASF SE | 2014-08-13 | — | — | CN | claimed |
| CN-103547631-A | Composition for metal electroplating comprising an additive for bottom-up filling of though silicon vias and interconnect features | BASF SE | 2014-01-29 | — | — | CN | claimed |
| CN-118253469-A | Laminate and method for producing same | 株式会社东进世美肯 | 2024-06-28 | — | — | CN | disclosed |
| CN-114867794-B | Water-repellent coating composition for wet coating comprising silsesquioxane oligomer | 株式会社东进世美肯 | 2023-10-27 | — | — | CN | disclosed |
| US-11761091-B2 | Surface activated polymers | SRG GLOBAL LIRIA, S.L. (ES) | 2023-09-19 | — | — | US | disclosed |
| CN-111511962-B | Surface-activated polymers | SRG利里亚全球有限公司 | 2023-02-28 | — | — | CN | disclosed |
| CN-114867794-A | Water-repellent coating composition for wet coating comprising silsesquioxane oligomer | 株式会社东进世美肯 | 2022-08-05 | — | — | CN | disclosed |
| WO-2010060901-A1 | PEPTIDES FOR TREATMENT OF OBESITY | NOVO NORDISK A/S (DK) | 2010-06-03 | — | — | WO | disclosed |
| CN-101400442-A | Mixed oxide catalysts | BASF SE (DE) | 2009-04-01 | — | — | CN | disclosed |
| CN-101107284-A | Composition comprising hydrogenated bisglycidyl ether and a crosslinker | BASF AG (DE) | 2008-01-16 | — | — | CN | disclosed |
| EP-0003246-B1 | POLYAMIDES AND THEIR USE | UNILEVER N.V. (NL) | 1981-12-23 | — | — | EP | disclosed |
| US-4247426-A | Polyamides | EMERY INDUSTRIES, INC. (US) | 1981-01-27 | — | — | US | disclosed |