SCHEMBL6801343

SCHEMBL6801343

CC(=O)CCC(C)=O.[Mo]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10001 0.95
SCHEMBL28060459 0.95 ALDH1A1 (1.00)
SCHEMBL27722569 0.91
SCHEMBL11615492 0.91
SCHEMBL27584016 0.91
SCHEMBL6669487 0.91
Formaldehyde SCHEMBL2873057 0.87 ALDH1A1 (0.83)
Levulinic Acid SCHEMBL11315581 0.86
SCHEMBL9856678 0.84 ALDH1A1 (0.77)
SCHEMBL8155389 0.84 ALDH1A1 (0.77)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743748-B2 OXIDIZING A COMPOUND HAVING AT LEAST ONE ETHYLENIC DOUBLE BOND; SILICONPOLYOXOMETALATE HAVING TWO DEFECTIVE AND/OR THREE DEFECTIVE STRUCTURE SITES NIPPON SHOKUBAI CO., LTD. (JP) 2004-06-01 US disclosed
EP-1380340-A2 CATALYST FOR PRODUCING EPOXY COMPOUND AND PROCESS FOR PRODUCING EPOXY COMPOUND WITH THE SAME Nippon Shokubai Co., Ltd. (JP) 2004-01-14 EP disclosed
US-20030171604-A1 Catalyst for producing epoxy compound and process for producing epoxy compounds with the same NIPPON SHOKUBAI CO., LTD . (JP) 2003-09-11 US disclosed