SCHEMBL6807344

SCHEMBL6807344

CCC(C)(C)C(=O)Nc1ccc(Cc2ccc(NC(=O)C(C)(C)C)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.61
MAPT P10636 4/20 0.50
ALDH1A1 P00352 2/20 0.50
MEN1 O00255 3/20 0.49
KMT2A Q03164 3/20 0.49
TDP1 Q9NUW8 1/20 0.49
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA7 P43166 1/20 0.47
CA9 Q16790 1/20 0.47
CA14 Q9ULX7 1/20 0.47
LMNA P02545 3/20 0.45
HTT P42858 2/20 0.44
SAE1 Q9UBE0 1/20 0.44
UBA2 Q9UBT2 1/20 0.44
TSHR P16473 1/20 0.44
RIPK1 Q13546 1/20 0.44
BRD4 O60885 1/20 0.43
PTGDR2 Q9Y5Y4 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10075598 0.95 MEN1 (0.53) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL12226381 0.92 L3MBTL1 (0.73) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL11918112 0.90 L3MBTL1 (0.76) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL18291139 0.89 MEN1 (0.48) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL8946141 0.88 MEN1 (0.66) L3MBTL1MEN1KMT2ATDP1LMNA
SCHEMBL18291152 0.87 L3MBTL1 (0.61) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL12226380 0.86 L3MBTL1 (0.61) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL22746617 0.84 MEN1 (0.54) L3MBTL1MEN1KMT2ATDP1LMNA
SCHEMBL10159848 0.83 MEN1 (0.51) L3MBTL1MAPTALDH1A1MEN1KMT2A
SCHEMBL16615925 0.83 L3MBTL1 (0.66) L3MBTL1MAPTALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3778249-A1 PRETREATMENT LIQUID, INK SET, IMAGE RECORDED MATERIAL, SUBSTRATE FOR IMAGE RECORDING, MANUFACTURING METHOD OF SUBSTRATE FOR IMAGE RECORDING, AND IMAGE RECORDING METHOD Fujifilm Corporation (JP) 2021-02-17 EP disclosed
US-8257913-B2 Processing method of lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2012-09-04 US disclosed
US-8182980-B2 Good in developability, staining resistance and dispersibility of photosensitive layer in the developing solution FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20090148793-A1 PROCESSING METHOD OF LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2009-06-11 US disclosed