⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22129636 | 0.89 | — | — | |
| SCHEMBL36991 | 0.89 | — | — | |
| SCHEMBL11183068 | 0.89 | — | — | |
| SCHEMBL2701619 | 0.86 | — | — | |
| SCHEMBL4856069 | 0.86 | — | — | |
| SCHEMBL10345890 | 0.85 | — | — | |
| Calcium SCHEMBL31207302 | 0.85 | — | — | |
| SCHEMBL539985 | 0.85 | — | — | |
| SCHEMBL31273742 | 0.85 | — | — | |
| SCHEMBL31207299 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 265 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250270239-A1 | PROCESS FOR THE PREPARATION OF HIGH PURITY NORBORNENE SILYL ETHERS | PROMERUS, LLC (US) | 2025-08-28 | — | — | US | claimed |
| US-12325722-B2 | Process for the preparation of high purity norbornene silyl ethers | PROMERUS, LLC (US) | 2025-06-10 | — | — | US | claimed |
| US-20250161536-A1 | CLICK-CROSSLINKED HYDROGELS AND METHODS OF USE | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2025-05-22 | — | — | US | claimed |
| CN-118684803-A | Polydicyclopentadiene resin and preparation method thereof | 四川大学 | 2024-09-24 | — | — | CN | claimed |
| WO-2024192314-A1 | PROCESS FOR THE PREPARATION OF HIGH PURITY NORBORNENE SILYL ETHERS | PROMERUS, LLC (US) | 2024-09-19 | — | — | WO | claimed |
| US-20240309025-A1 | PROCESS FOR THE PREPARATION OF HIGH PURITY NORBORNENE SILYL ETHERS | PROMERUS, LLC (US) | 2024-09-19 | — | — | US | claimed |
| US-12053561-B2 | Click-crosslinked hydrogels and methods of use | PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 2024-08-06 | — | — | US | claimed |
| CN-115894869-B | Thermosetting cross-linked resin and preparation method thereof | 四川大学 | 2024-05-31 | — | — | CN | claimed |
| EP-3730160-B1 | CLICK-CROSSLINKED HYDROGELS AND METHODS OF USE | HARVARD COLLEGE (US) | 2023-06-07 | — | — | EP | claimed |
| CN-115894869-A | Thermosetting crosslinked resin and preparation method thereof | 四川大学 | 2023-04-04 | — | — | CN | claimed |
| WO-2014099546-A1 | PROCESS FOR THE PREPARATION OF HIGH PURITY NORBORNENE ALKANOLS AND DERIVATIVES THEREOF | PROMERUS, LLC (US) | 2014-06-26 | — | — | WO | claimed |
| US-20100160557-A1 | REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION, AND CURED MATERIAL | SHOWA DENKO K.K. (JP) | 2010-06-24 | — | — | US | claimed |
| CN-101679555-A | Reactive urethane compound having ether bond, curable composition and cured product | SHOWA DENKO KK | 2010-03-24 | — | — | CN | claimed |
| EP-2154162-A1 | REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED PRODUCT | Showa Denko K.K. (JP) | 2010-02-17 | — | — | EP | claimed |
| US-6893793-B2 | Photosensitive polymer and chemically amplified photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-05-17 | — | — | US | claimed |
| US-20030170563-A1 | Photosensitive polymer and chemically amplified photoresist composition containing the same | JUNG DONG-WON (KR) | 2003-09-11 | — | — | US | claimed |
| US-6593441-B2 | Norbornene ester with a C1-12 aliphatic alcohol substituent and maleic anhydride monomers | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-15 | — | — | US | claimed |
| US-20020193542-A1 | Photosensitive polymer and chemically amplified photoresist composition containing the same | JUNG DONG-WON (KR) | 2002-12-19 | — | — | US | claimed |
| US-6358675-B1 | PHOTORESISTS, PATTERNS, MULTISTAGE REACTION, COATING ON SUPPORTS A SILICON POLYMER, EXPOSURE TO ACTINIC RADIATION AND DEVELOPMENT OF LATENT IMAGES AND POLYMERS | 3M INNOVATIVE PROPERTIES COMPANY | 2002-03-19 | — | — | US | claimed |
| US-4987200-A | METALLIZATION BEFORE POLYMERIZATION | EXXON CHEMICAL PATENTS INC. (US) | 1991-01-22 | — | — | US | claimed |