SCHEMBL68167

SCHEMBL68167

C=CCN1C(C)(C)CC(OC(=O)C=C)CC1(C)C

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.31
KMT2A Q03164 1/20 0.31
GAA P10253 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL224032 0.86 TSHR (0.33) TSHRKMT2AGAAHTT
SCHEMBL11401702 0.84 TSHR (0.31) TSHRKMT2AGAAHTT
SCHEMBL225587 0.83 TSHR (0.34) TSHRKMT2A
SCHEMBL11367464 0.82 TSHR (0.35) TSHRKMT2AGAA
SCHEMBL11034077 0.82 NAAA (0.39) TSHRKMT2AGAA
SCHEMBL11033839 0.81 NAAA (0.41) TSHRKMT2AGAA
SCHEMBL225056 0.81 TSHR (0.39) TSHRKMT2AGAA
SCHEMBL8849439 0.81 TSHR (0.42) TSHR
SCHEMBL8587561 0.81 BCHE (0.35)
SCHEMBL11838219 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2070998-B1 Inkjet recording ink composition and inkjet recording method FUJIFILM CORP (JP) 2015-04-08 EP disclosed
US-8128843-B2 Photocurable composition, photocurable ink composition, process for producing photocured material, and inkjet recording method FUJIFILM CORPORATION (JP) 2012-03-06 US disclosed
US-8128843-B2 Photocurable composition, photocurable ink composition, process for producing photocured material, and inkjet recording method FUJIFILM CORPORATION (JP) 2012-03-06 US disclosed
US-8092869-B2 Ink composition for ink jet recording and method for ink jet recording FUJIFILM CORPORATION (JP) 2012-01-10 US disclosed
US-8092869-B2 Ink composition for ink jet recording and method for ink jet recording FUJIFILM CORPORATION (JP) 2012-01-10 US disclosed
EP-2085439-A1 Photocurable composition, photocurable ink composition, process for producing photocured material, and inkjet recording method FUJIFILM Corporation (JP) 2009-08-05 EP disclosed
US-20090186163-A1 PHOTOCURABLE COMPOSITION, PHOTOCURABLE INK COMPOSITION, PROCESS FOR PRODUCING PHOTOCURED MATERIAL, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2009-07-23 US disclosed
US-20090186163-A1 PHOTOCURABLE COMPOSITION, PHOTOCURABLE INK COMPOSITION, PROCESS FOR PRODUCING PHOTOCURED MATERIAL, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2009-07-23 US disclosed
US-20090155484-A1 Inkjet recording ink composition and inkjet recording method FUJIFILM CORPORATION (JP) 2009-06-18 US disclosed
US-20090155484-A1 Inkjet recording ink composition and inkjet recording method FUJIFILM CORPORATION (JP) 2009-06-18 US disclosed
EP-1927477-A1 Ink composition for inkjet-recording and method for inkjet-recording FUJIFILM Corporation (JP) 2008-06-04 EP disclosed
US-5288777-A Adding sterically hindered piperidines CIBA-GEIGY CORPORATION (US) 1994-02-22 US disclosed
US-5135986-A Graft polymers of styrene or A-methylstyrene and a comonomer on a core of elastomer modified by a steric hindered unsaturated 2,2,6,6-tetramethylpiperidine compoune; photostability CIBA-GEIGY CORPORATION (US) 1992-08-04 US disclosed
US-4294949-A ACRYLATES OR ACRYLAMIDES WHICH CARRY N-HETEROCYCLIC RINGS CIBA-GEIGY CORPORATION (US) 1981-10-13 US disclosed
US-4276401-A N-Heterocyclic substituted acryloyl polymeric compounds CIBA-GEIGY CORPORATION (US) 1981-06-30 US disclosed
US-4256627-A COMPRISING COMPLEXES OF POLYMERS HAVING UNITS CONTAINING ALKYLPIPERIDINE GROUPS AND NICKEL OR COBALT CARBOXYLATES OR ENOLATES CIBA-GEIGY CORPORATION (US) 1981-03-17 US disclosed
US-4210612-A LIGHT STABILIZERS FOR PLASTICS CIBA-GEIGY CORPORATION (US) 1980-07-01 US disclosed
EP-0010518-A1 Acrylic copolymers bearing N-heterocyclic side rings, their use, and process for their preparation CIBA-GEIGY AG (CH) 1980-04-30 EP disclosed
EP-0001840-A2 Stabilising mixtures, process for stabilising synthetic materials against light with these mixtures and synthetic materials so stabilised CIBA-GEIGY AG (CH) 1979-05-16 EP disclosed
EP-0000496-A1 Acrylic polymers substituted by N-heterocyclic rings and their use as light protection agents CIBA-GEIGY AG (CH) 1979-02-07 EP disclosed