Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA4 | P22748 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | NPC1 | O15118 | 3/20 | 0.36 |
| ▸ | RAB9A | P51151 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | CA6 | P23280 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | MC4R | P32245 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8879011 | 0.98 | CA1 (0.43) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL8877151 | 0.96 | KMT2A (0.40) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL6995240 | 0.76 | KMT2A (0.52) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL1713454 | 0.73 | — | — | |
| SCHEMBL21047881 | 0.70 | TRIM24 (0.41) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL21047669 | 0.70 | TRIM24 (0.41) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL21047859 | 0.70 | TRIM24 (0.41) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL21047899 | 0.70 | TRIM24 (0.41) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL21047564 | 0.70 | TRIM24 (0.41) | KMT2ACA1CA2CA4ALDH1A1 | |
| SCHEMBL244367 | 0.69 | KMT2A (0.41) | KMT2ACA1CA2CA4ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7025846-A | — | — | None | — | — | JP | disclosed |
| CN-108700835-A | Resist pattern forming method and resist | 日本瑞翁株式会社 | 2018-10-23 | — | — | CN | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| EP-1353225-B1 | Radiation sensitive composition and compound | FUJIFILM CORP (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-8557499-B2 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2013-10-15 | — | — | US | disclosed |
| US-8460851-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-06-11 | — | — | US | disclosed |
| CN-102117013-A | Photoresist composition | SUMITOMO CHEMICAL CO | 2011-07-06 | — | — | CN | disclosed |
| CN-101684166-A | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL CO | 2010-03-31 | — | — | CN | disclosed |
| US-7445881-B2 | Method of manufacturing semiconductor device, acid etching resistant material and copolymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-11-04 | — | — | US | disclosed |
| US-20070184382-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-08-09 | — | — | US | disclosed |
| CN-1289966-C | Positive photoetching gum composition and method for forming photoetching gum pattern using the same | TOKYO APPLIED CHEMICAL IND CO (JP) | 2006-12-13 | — | — | CN | disclosed |
| CN-1207632-C | Chemical enhancement type positive photoetching gum composition | SUMOTOMO CHEMICAL CO LTD (JP) | 2005-06-22 | — | — | CN | disclosed |
| CN-1591185-A | Positive photoetching gum composition and method for forming photoetching gum pattern using the same | TOKYO APPLIED CHEMICAL IND CO (JP) | 2005-03-09 | — | — | CN | disclosed |
| EP-1041442-B1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL CO (JP) | 2004-10-27 | — | — | EP | disclosed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |
| CN-1268680-A | Chemical enhancement type positive photoetching gum composition | SUMOTOMO CHEMICAL CO LTD (JP) | 2000-10-04 | — | — | CN | disclosed |
| US-5635332-A | MIXTURE WITH ULTRAVIOLET TRANSPARENT POLYMER HAVING GROUPS WHICH ARE UNSTABLE TO ACID | NEC CORPORATION (JP) | 1997-06-03 | — | — | US | disclosed |
| US-5585507-A | FINENESS PATTERNS | NEC CORPORATION (JP) | 1996-12-17 | — | — | US | disclosed |
| JP-H0725846-A | ALKYLSULFONIUM SALT | NEC CORP | 1995-01-27 | — | — | JP | disclosed |