Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 3/20 | 0.38 |
| ▸ | CA2 | P00918 | 3/20 | 0.38 |
| ▸ | CA4 | P22748 | 3/20 | 0.38 |
| ▸ | DAO | P14920 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | CA6 | P23280 | 2/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | KDM6B | O15054 | 1/20 | 0.31 |
| ▸ | KDM4A | O75164 | 1/20 | 0.31 |
| ▸ | KDM4D | Q6B0I6 | 1/20 | 0.31 |
| ▸ | KDM3B | Q7LBC6 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL15345265 | 0.86 | KMT2A (0.32) | KMT2AALDH1A1MAPTEPHX1KDM6B | |
| Trifluoromethanesulfonic Acid SCHEMBL7082064 | 0.85 | KMT2A (0.31) | KMT2AALDH1A1MAPT | |
| SCHEMBL28377989 | 0.81 | KMT2A (0.38) | KMT2AALDH1A1MAPTCA1CA2 | |
| SCHEMBL29520443 | 0.79 | ALDH1A1 (0.40) | KMT2AALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL14442071 | 0.76 | CA1 (0.45) | KMT2AALDH1A1MAPTCA1CA2 | |
| SCHEMBL8879148 | 0.73 | CA1 (0.42) | KMT2AALDH1A1MAPTCA1CA2 | |
| SCHEMBL758778 | 0.72 | KMT2A (0.36) | KMT2AALDH1A1MAPTCA1CA2 | |
| SCHEMBL6995240 | 0.71 | KMT2A (0.52) | KMT2AALDH1A1MAPTCA1CA2 | |
| SCHEMBL14508480 | 0.70 | CA1 (0.39) | KMT2AALDH1A1MAPTCA1CA2 | |
| SCHEMBL6820926 | 0.69 | KMT2A (0.45) | KMT2AALDH1A1MAPTCA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 589 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| US-7122294-B2 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-10-17 | — | — | US | claimed |
| US-7078444-B2 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-07-18 | — | — | US | claimed |
| US-20050158655-A1 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2005-07-21 | — | — | US | claimed |
| US-6841333-B2 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2005-01-11 | — | — | US | claimed |
| US-20040234888-A1 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-11-25 | — | — | US | claimed |
| US-20040087690-A1 | Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-05-06 | — | — | US | claimed |
| US-20030207049-A1 | Liquid crystal display unit and method for manufacturing the same | NEC CORPORATION | 2003-11-06 | — | — | US | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| US-20260093177-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| US-12493244-B2 | Photosensitive resin composition, photosensitive dry film, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-09 | — | — | US | disclosed |
| EP-0824223-A1 | Photosensitive resin composition for far-ultraviolet exposure | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-18 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5585507-A | FINENESS PATTERNS | NEC CORPORATION (JP) | 1996-12-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260093177-A1 | PATTERNING PROCESS | ARFGAP1, ARF1, ARF4 | KMT2A 893/4885ALDH1A1 2715/4885MAPT 1850/4885 |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | RAD51, CDH1, SMC2 | KMT2A 714/4885ALDH1A1 1225/4885MAPT 1741/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.