SCHEMBL682270

SCHEMBL682270

CCC(C)c1ccc(OC(C)OCCOc2c(-c3cccc(OC)c3)cccc2-c2cccc(OC)c2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 3/20 0.39
AKR1C2 P52895 3/20 0.39
ALDH1A1 P00352 3/20 0.37
MAPT P10636 2/20 0.37
KDM4E B2RXH2 1/20 0.37
MEN1 O00255 1/20 0.37
POLB P06746 1/20 0.37
KMT2A Q03164 1/20 0.37
MAPK1 P28482 1/20 0.36
GAA P10253 2/20 0.36
NPSR1 Q6W5P4 1/20 0.36
HPGD P15428 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
CYP17A1 P05093 1/20 0.35
AKR1C4 P17516 1/20 0.35
AKR1C1 Q04828 1/20 0.35
SMARCA2 P51531 1/20 0.35
SMARCA4 P51532 1/20 0.35
BRD9 Q9H8M2 1/20 0.35
CASR P41180 4/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16382401 0.95 AKR1C3 (0.36) AKR1C3AKR1C2ALDH1A1MAPTKDM4E
SCHEMBL2758497 0.90 NPSR1 (0.44) AKR1C3AKR1C2ALDH1A1MAPTKDM4E
SCHEMBL2758509 0.88 TDP1 (0.34) AKR1C3AKR1C2ALDH1A1MEN1KMT2A
SCHEMBL682221 0.88 SLC7A5 (0.41) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL2758470 0.85 NPSR1 (0.49) ALDH1A1MAPTKDM4EMEN1POLB
SCHEMBL11999026 0.83 SLC7A5 (0.37) AKR1C3AKR1C2ALDH1A1MAPTKDM4E
SCHEMBL14118434 0.82 AKR1C3 (0.43) AKR1C3AKR1C2ALDH1A1MAPTKDM4E
SCHEMBL11922902 0.81 FFAR1 (0.36) ALDH1A1MAPTKDM4EMEN1KMT2A
SCHEMBL2758499 0.81 SLC7A5 (0.41) ALDH1A1MEN1KMT2ANPSR1SLC7A5
SCHEMBL13163602 0.81 AKR1C3 (0.37) AKR1C3AKR1C2ALDH1A1KDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20150010855-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2015-01-08 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120003585-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed