SCHEMBL6826868

SCHEMBL6826868

C=C(C)OC=C([SiH3])OC(=C)C

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1312817 0.74 HSD17B10 (0.39) HSD17B10TDP1
SCHEMBL11417286 0.69
SCHEMBL2597482 0.67
SCHEMBL1639807 0.65 HSD17B10 (0.41) HSD17B10TDP1
SCHEMBL1620154 0.65
SCHEMBL29972 0.64
SCHEMBL27437745 0.64 TDP1 (0.60) HSD17B10TDP1
Ethane SCHEMBL3288242 0.61
Methyl Alcohol SCHEMBL11644599 0.61
Methane SCHEMBL5786697 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6740725-B2 POLYSILOXANE WITH ALKENOXYSILANE AND GUANIDINE ALKYL SILANE GROUPS; NO DECLINE OF INSULATION RESISTANCE OCCURS WHEN VOLTAGE IS APPLIED IN A HOT HUMID ENVIRONMENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-05-25 US claimed