Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29972 | 0.69 | — | — | |
| SCHEMBL27437745 | 0.69 | TDP1 (0.60) | HSD17B10TDP1 | |
| Ethylene SCHEMBL27362925 | 0.66 | — | — | |
| Ethane SCHEMBL3288242 | 0.66 | — | — | |
| Methane SCHEMBL5786697 | 0.66 | — | — | |
| Methyl Alcohol SCHEMBL11644599 | 0.66 | — | — | |
| Fluoride SCHEMBL27416012 | 0.66 | — | — | |
| SCHEMBL6826868 | 0.65 | HSD17B10 (0.36) | HSD17B10TDP1 | |
| SCHEMBL360779 | 0.65 | ALDH1A1 (0.50) | HSD17B10TDP1 | |
| SCHEMBL5146024 | 0.65 | HSD17B10 (0.41) | HSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118725482-A | Anti-aging insulated cable material and preparation method thereof | 富通光纤光缆（深圳）有限公司 | 2024-10-01 | — | — | CN | claimed |
| CN-115745614-A | Nano-metal toughened silicon carbide ceramic material and preparation method thereof | 厦门大学 | 2023-03-07 | — | — | CN | claimed |
| CN-114879449-A | High-temperature-resistant polyimide photoresist and preparation method and application thereof | 江苏长进微电子材料有限公司 | 2022-08-09 | — | — | CN | claimed |
| CN-110137426-B | Preparation method of pole piece with PTC coating and lithium ion battery | 珠海冠宇电池股份有限公司 | 2022-02-15 | — | — | CN | claimed |
| US-20210102053-A1 | ELASTOMER COMPOSITION, ELASTOMER, METHOD FOR PREPARING ELASTOMER, AND ADHESIVE TAPE | 3M INNOVATIVE PROPERTIES COMPANY | 2021-04-08 | — | — | US | claimed |
| EP-3611222-A1 | ELASTOMER COMPOSITION, ELASTOMER, METHOD FOR USE IN PREPARING ELASTOMER AND ADHESIVE TAPE | 3M Innovative Properties Company (US) | 2020-02-19 | — | — | EP | claimed |
| EP-4039759-B1 | ANTIFOULING COATING COMPOSITION | NITTO KASEI CO LTD (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-118725482-A | Anti-aging insulated cable material and preparation method thereof | 富通光纤光缆（深圳）有限公司 | 2024-10-01 | — | — | CN | disclosed |
| CN-117018876-A | Preparation method of graphene oxide reverse osmosis membrane and graphene oxide reverse osmosis membrane | 中集安瑞科工程科技有限公司 | 2023-11-10 | — | — | CN | disclosed |
| CN-115157809-B | Pre-laid waterproof coiled material and preparation method thereof | 科顺防水科技股份有限公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-115745614-A | Nano-metal toughened silicon carbide ceramic material and preparation method thereof | 厦门大学 | 2023-03-07 | — | — | CN | disclosed |
| CN-115157809-A | Pre-laid waterproof coiled material and preparation method thereof | 科顺防水科技股份有限公司 | 2022-10-11 | — | — | CN | disclosed |
| EP-3978575-A1 | ANTIFOULING COATING COMPOSITION | Nitto Kasei Co., Ltd. (JP) | 2022-04-06 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| US-6342716-B1 | Semiconductor device having dot elements as floating gate | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2002-01-29 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-6303516-B1 | Method for forming dot element | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-10-16 | — | — | US | disclosed |
| US-5969075-A | MIXING WITH FINELY DIVIDED SILICA, AMINO-BEARING SILANE,ORGANIC SILICON COMPOUND AND CURING CATALYST | SHIN-ETSU SILICONES OF AMERICA (US) | 1999-10-19 | — | — | US | disclosed |
| EP-0926260-A2 | Using antibody - antigen interaction for formation of a patterened metal film | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1999-06-30 | — | — | EP | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |