Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | PKM | P14618 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6058401 | 0.80 | ALDH1A1 (0.61) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL26611017 | 0.80 | ALDH1A1 (0.61) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL26611013 | 0.80 | ALDH1A1 (0.61) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL5935979 | 0.80 | ALDH1A1 (0.57) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL21776278 | 0.79 | ALDH1A1 (0.52) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL23406969 | 0.79 | POLB (0.64) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL301686 | 0.79 | ALDH1A1 (0.64) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL5811941 | 0.79 | ALDH1A1 (0.59) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL21987803 | 0.79 | POLB (0.64) | ALDH1A1PKML3MBTL1POLBGAA | |
| SCHEMBL23406968 | 0.79 | POLB (0.64) | ALDH1A1PKML3MBTL1POLBGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |