SCHEMBL6829951

SCHEMBL6829951

CC(O)CN(CCC#N)CCC#N

nearest known ligand 0.54

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.39
CYP1A2 P05177 1/20 0.38
MAPK1 P28482 1/20 0.38
TSHR P16473 3/20 0.34
KDM4E B2RXH2 1/20 0.32
ALDH1A1 P00352 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
DRD3 P35462 1/20 0.30
RECQL P46063 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11047390 0.95 LCK (0.39) LCKCYP1A2MAPK1TSHRKDM4E
SCHEMBL11701824 0.77 LCK (0.43) LCKCYP1A2MAPK1TSHRALDH1A1
SCHEMBL150669 0.76 MAPK1 (0.58) LCKCYP1A2MAPK1TSHRALDH1A1
SCHEMBL7720644 0.76 LCK (0.38) LCKKDM4EALDH1A1
SCHEMBL713835 0.76 LCK (0.38) LCKCYP1A2MAPK1TSHR
SCHEMBL1010512 0.75 TSHR (0.40) TSHRKDM4EALDH1A1TDP1RECQL
SCHEMBL6260966 0.75 KDM4E (0.38) TSHRKDM4EALDH1A1TDP1RECQL
SCHEMBL1446865 0.75 KDM4E (0.38) TSHRKDM4EALDH1A1TDP1RECQL
Edetol SCHEMBL2803498 0.72 TSHR (0.39) TSHRKDM4EALDH1A1TDP1RECQL
Edetol SCHEMBL48412 0.72 TSHR (0.39) TSHRKDM4EALDH1A1TDP1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117285742-A Diallyl ammonium salt composition and preparation method thereof 江苏海洋大学 2023-12-26 CN claimed
CN-117285742-A Diallyl ammonium salt composition and preparation method thereof 江苏海洋大学 2023-12-26 CN disclosed
US-6743564-B2 A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-06-01 US disclosed
US-20020115018-A1 Amine compounds, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed