⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4575535 | 0.62 | — | — | |
| SCHEMBL10600250 | 0.53 | NOTUM (0.30) | — | |
| SCHEMBL2966317 | 0.49 | — | — | |
| SCHEMBL31532230 | 0.49 | — | — | |
| SCHEMBL1334575 | 0.49 | — | — | |
| SCHEMBL23617 | 0.49 | — | — | |
| Water SCHEMBL18979260 | 0.46 | — | — | |
| Bromide SCHEMBL5108256 | 0.46 | — | — | |
| SCHEMBL5513240 | 0.46 | — | — | |
| Lithium SCHEMBL31206119 | 0.46 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260136848-A1 | DEPOSITION OF METAL-CONTAINING FILMS | LAM RES CORP (US) | 2026-05-14 | — | — | US | disclosed |
| US-20250382703-A1 | PLASMA ENHANCED LOW TEMPERATURE ATOMIC LAYER DEPOSITION OF METALS | LAM RES CORP (US) | 2025-12-18 | — | — | US | disclosed |
| WO-2025217071-A1 | ISONITRILE INHIBITORS IN ALD | LAM RESEARCH CORPORATION (US) | 2025-10-16 | — | — | WO | disclosed |
| WO-2025129090-A1 | INTEGRATED PROCESS FOR METALLIZATION | LAM RESEARCH CORPORATION (US) | 2025-06-19 | — | — | WO | disclosed |
| EP-4544095-A1 | PLASMA ENHANCED LOW TEMPERATURE ATOMIC LAYER DEPOSITION OF METALS | LAM Research Corporation (US) | 2025-04-30 | — | — | EP | disclosed |
| WO-2025059038-A1 | MOLYBDENUM IN LOGIC BEOL METALLIZATION | LAM RESEARCH CORPORATION (US) | 2025-03-20 | — | — | WO | disclosed |
| US-20250069948-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2025-02-27 | — | — | US | disclosed |
| US-20250038003-A1 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | LAM RESEARCH CORPORATION (US) | 2025-01-30 | — | — | US | disclosed |
| WO-2025019214-A1 | DEPOSITION OF METAL-CONTAINING FILMS USING HALOGEN-CONTAINING ACTIVATOR MOLECULES | LAM RESEARCH CORPORATION (US) | 2025-01-23 | — | — | WO | disclosed |
| CN-119194406-A | Precursor for depositing molybdenum-containing film | 朗姆研究公司 | 2024-12-27 | — | — | CN | disclosed |
| US-20190148167-A1 | ETCHING GAS MIXTURE, METHOD OF FORMING PATTERN BY USING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE ETCHING GAS MIXTURE | Wonik Materials (KR) | 2019-05-16 | — | — | US | disclosed |
| CN-105378960-B | Electrode surface modification layer for electronic devices | 剑桥显示技术有限公司 | 2018-09-18 | — | — | CN | disclosed |
| US-9793504-B2 | Electrode surface modification layer for electronic devices | CAMBRIDGE DISPLAY TECHNOLOGY LIMITED (GB) | 2017-10-17 | — | — | US | disclosed |
| US-20160149147-A1 | ELECTRODE SURFACE MODIFICATION LAYER FOR ELECTRONIC DEVICES | CAMBRIDGE DISPLAY TECHNOLOGY LIMITED (GB) | 2016-05-26 | — | — | US | disclosed |
| WO-2008061517-A2 | USE OF DITHIOL TRANSITION METAL COMPLEXES AND COMPOUNDS ANALOGOUS TO SELENIUM AS DOPANTS | NOVALED AG (DE) | 2008-05-29 | — | — | WO | disclosed |
| US-6743960-B2 | CONTACTING AN OLEFINIC MONOMERS FEED WITH A CATALYST CONTAINING A BIS/DITHIOALKYL OR ARYL/METAL(A LATE TRANSITION METAL) OR DERIVATIVES AND AN ACTIVATING CATALYST, OLIGOMERIZING THE MONOMER TO FORM AN OLIGOMER PRODUCT | EXXONMOBIL RESEARCH AND ENGINEERING COMPANY | 2004-06-01 | — | — | US | disclosed |
| US-20030105374-A1 | Method for oligomerizing olefins to form higher olefins using sulfur-containing and sulfur-tolerant catalysts | EXXONMOBIL CHEMICAL PATENTS INC. | 2003-06-05 | — | — | US | disclosed |
| EP-1169286-A2 | THE USE OF METAL DITHIOLENE COMPLEXES IN SELECTIVE OLEFIN RECOVERY | ExxonMobil Research and Engineering Company (US) | 2002-01-09 | — | — | EP | disclosed |
| WO-2000061527-A2 | THE USE OF METAL DITHIOLENE COMPLEXES IN SELECTIVE OLEFIN RECOVERY | EXXONMOBIL RESEARCH AND ENGINEERING COMPANY (US) | 2000-10-19 | — | — | WO | disclosed |
| US-6120692-A | Use of metal dithiolene complexes in selective olefin recovery (law760) | EXXON RESEARCH AND ENGINEERING COMPANY (US) | 2000-09-19 | — | — | US | disclosed |