Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | ADH1A | P07327 | 3/20 | 0.30 |
| ▸ | ADH1C | P00326 | 2/20 | 0.30 |
| ▸ | ADH1B | P00325 | 1/20 | 0.30 |
| ▸ | ADH4 | P08319 | 1/20 | 0.30 |
| ▸ | ADH7 | P40394 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6831578 | 0.88 | CYP1A2 (0.31) | CYP1A2CYP2D6 | |
| SCHEMBL7911044 | 0.79 | CYP1A2 (0.36) | CYP1A2CYP2D6ADH1AADH1CADH1B | |
| SCHEMBL7911043 | 0.79 | CYP1A2 (0.36) | CYP1A2CYP2D6ADH1AADH1CADH1B | |
| SCHEMBL7995532 | 0.78 | CYP1A2 (0.38) | CYP1A2CYP2D6 | |
| SCHEMBL27720921 | 0.77 | — | — | |
| SCHEMBL28038137 | 0.75 | CYP1A2 (0.41) | CYP1A2CYP2D6 | |
| SCHEMBL113622 | 0.74 | HTT (0.36) | CYP1A2CYP2D6 | |
| SCHEMBL21061283 | 0.74 | HTT (0.36) | CYP1A2CYP2D6 | |
| SCHEMBL3891585 | 0.72 | SLC6A12 (0.40) | CYP1A2CYP2D6 | |
| SCHEMBL19140825 | 0.71 | MAPT (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101160305-A | Substituted chroman derivatives, method for the production and the use thereof in the form of antiphlogistics | SCHERING AG (DE) | 2008-04-09 | — | — | CN | disclosed |
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |