⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13089205 | 0.78 | — | — | |
| SCHEMBL16728745 | 0.77 | — | — | |
| SCHEMBL13089580 | 0.75 | — | — | |
| SCHEMBL702648 | 0.71 | — | — | |
| SCHEMBL6920596 | 0.71 | TSHR (0.35) | — | |
| SCHEMBL13089120 | 0.69 | — | — | |
| SCHEMBL18095467 | 0.69 | — | — | |
| SCHEMBL13089553 | 0.68 | — | — | |
| SCHEMBL13089560 | 0.67 | TSHR (0.32) | — | |
| SCHEMBL13089220 | 0.67 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114616652-A | Monoalkoxysilanes and dense organosilica films prepared therefrom | 弗萨姆材料美国有限责任公司 | 2022-06-10 | — | — | CN | claimed |
| US-20100261925-A1 | METHOD FOR PRODUCING SILICON COMPOUND | JSR CORPORATION (JP) | 2010-10-14 | — | — | US | disclosed |
| US-6743885-B2 | MIXTURE OF POLYSILSESQUIOXANE AND ACID GENERATOR | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20030092854-A1 | Resin composition for intermediate layer of three-layer resist | SUMITOMO CHEMICAL COMPANY, LIMITED | 2003-05-15 | — | — | US | disclosed |