SCHEMBL6830188

SCHEMBL6830188

O=C(Cl)CCCCC1CC2C=CC1C2

nearest known ligand 0.39

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 9/20 0.39
ALDH1A1 P00352 7/20 0.39
TDP1 Q9NUW8 3/20 0.39
EPHX2 P34913 2/20 0.37
LMNA P02545 1/20 0.36
TSHR P16473 2/20 0.34
PKM P14618 2/20 0.33
IL1B P01584 1/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
HTT P42858 1/20 0.33
TP53 P04637 1/20 0.32
POLB P06746 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18874578 0.86 ALOX5 (0.45) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL13346502 0.86 KMT2A (0.40) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL5073030 0.86 ALOX5 (0.45) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL13346657 0.85 ALOX5 (0.47) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL13346652 0.85 ALOX5 (0.47) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL13346499 0.85 KMT2A (0.39) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL13346352 0.85 KDM4E (0.39) KDM4EALDH1A1TDP1EPHX2LMNA
Hydrochloric Acid SCHEMBL6830191 0.85 ALOX5 (0.44) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL13346490 0.85 KMT2A (0.39) KDM4EALDH1A1TDP1EPHX2LMNA
SCHEMBL13346494 0.85 KMT2A (0.39) KDM4EALDH1A1TDP1EPHX2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743566-B2 (1,3-DIOXOLAN-4-YL)ALKYL 5-NORBORNENE-2-CARBOXYLATE USEFUL-AS A MONOMER TO FORM A POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-06-01 US disclosed
US-20030045731-A1 Cyclic acetal compound, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-03-06 US disclosed
US-6515150-B2 Photoresist resin; exposure to high energy radiation; development SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-02-04 US disclosed
US-20020147290-A1 Cyclic acetal compound, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-10-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030045731-A1 Cyclic acetal compound, polymer, resist composition and patterning process PARP1, CD38, RAD51 KDM4E 331/4885ALDH1A1 811/4885TDP1 3186/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.