⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2180105 | 0.97 | POLB (1.00) | — | |
| SCHEMBL22691929 | 0.97 | POLB (1.00) | — | |
| SCHEMBL66077 | 0.94 | — | — | |
| SCHEMBL64284 | 0.92 | POLB (0.81) | — | |
| SCHEMBL153467 | 0.92 | POLB (0.81) | — | |
| SCHEMBL15650449 | 0.92 | POLB (0.81) | — | |
| SCHEMBL11051019 | 0.90 | POLB (0.77) | — | |
| SCHEMBL22691902 | 0.89 | POLB (0.83) | — | |
| SCHEMBL1344289 | 0.88 | ALDH1A1 (1.00) | — | |
| SCHEMBL383162 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6743564-B2 | A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-01 | — | — | US | claimed |
| US-4985584-A | RING OPENING REACTION WITH N2O4 OR N2O5 | SECRETARY OF STATE FOR DEFENCE (GB) | 1991-01-15 | — | — | US | claimed |
| CN-103333275-B | With the polymkeric substance of functionalized with nitrile compounds comprising protected amino | BRIDGESTONE CO., LTD. (JP) | 2015-07-29 | — | — | CN | disclosed |
| CN-103025816-B | Polymers functionalized with nitrile compounds containing a protected amino group | BRIDGESTONE CORP | 2015-07-22 | — | — | CN | disclosed |
| CN-103333275-A | Polymers functionalized with nitrile compounds containing a protected amino group | BRIDGESTONE CORP | 2013-10-02 | — | — | CN | disclosed |
| CN-102361887-B | Polymers functionalized with nitrile compounds containing a protected amino group | BRIDGESTONE CORP | 2013-06-26 | — | — | CN | disclosed |
| CN-103025816-A | Polymers functionalized with nitrile compounds containing a protected amino group | BRIDGESTONE CORP | 2013-04-03 | — | — | CN | disclosed |
| US-6743564-B2 | A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20020115018-A1 | Amine compounds, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-22 | — | — | US | disclosed |
| EP-0223440-B1 | A PROCESS FOR THE PRODUCTION OF HIGH ENERGY MATERIAL | The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and (GB) | 1991-03-06 | — | — | EP | disclosed |
| US-4985584-A | RING OPENING REACTION WITH N2O4 OR N2O5 | SECRETARY OF STATE FOR DEFENCE (GB) | 1991-01-15 | — | — | US | disclosed |
| EP-0223440-A1 | A process for the production of high energy material | The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and (GB) | 1987-05-27 | — | — | EP | disclosed |