SCHEMBL6830745

SCHEMBL6830745

COC(CN(CCC#N)CCC#N)OC

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.38
CYP1A2 P05177 1/20 0.32
MAPK1 P28482 1/20 0.32
TSHR P16473 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2966877 0.72
SCHEMBL11701824 0.71 LCK (0.43) LCKCYP1A2MAPK1TSHR
SCHEMBL6829951 0.71 LCK (0.39) LCKCYP1A2MAPK1TSHR
SCHEMBL150669 0.70 MAPK1 (0.58) LCKCYP1A2MAPK1TSHR
SCHEMBL713835 0.70 LCK (0.38) LCKCYP1A2MAPK1TSHR
SCHEMBL65032 0.69 LCK (0.62) LCKMAPK1TSHR
SCHEMBL441892 0.69
SCHEMBL64618 0.68 LCK (0.45) LCK
SCHEMBL65789 0.68 LCK (0.45) LCK
SCHEMBL26051711 0.67 TSHR (0.43) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743564-B2 A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-06-01 US disclosed
US-20020115018-A1 Amine compounds, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-08-22 US disclosed