⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6834982 | 0.81 | — | — | |
| SCHEMBL10305871 | 0.80 | — | — | |
| SCHEMBL6831512 | 0.78 | — | — | |
| SCHEMBL13481233 | 0.77 | — | — | |
| SCHEMBL23963389 | 0.77 | — | — | |
| SCHEMBL47569 | 0.76 | CYP3A4 (0.33) | — | |
| SCHEMBL6367316 | 0.76 | HMGCR (0.36) | — | |
| SCHEMBL23963390 | 0.76 | — | — | |
| SCHEMBL18845179 | 0.75 | PRKCA (0.31) | — | |
| SCHEMBL18844986 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110054133-A1 | RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20110054133-A1 | RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-03-03 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-6746818-B2 | (METH)ACRYLATE COMPOUNDS HAVING A NORBORNANE, BICYCLO(2.2.2) OCTANE, 7-OXANORBORNANE OR CYCLOHEXANE RING STRUCTURE AND A GAMMA-BUTYROLACTONE RING STRUCTURE CONNECTED TOGETHER BY A LINKER, USEFUL IN FORMING POLYMER WITH HIGH TRANSPARENCY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-08 | — | — | US | disclosed |
| US-20030008232-A1 | Novel (meth) acrylates having lactone structure, polymers, photoresist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-09 | — | — | US | disclosed |