Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 13/20 | 0.45 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | DPP8 | Q6V1X1 | 2/20 | 0.35 |
| ▸ | DPP9 | Q86TI2 | 2/20 | 0.35 |
| ▸ | FAP | Q12884 | 1/20 | 0.35 |
| ▸ | PITRM1 | Q5JRX3 | 1/20 | 0.35 |
| ▸ | DPP7 | Q9UHL4 | 1/20 | 0.35 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.35 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.35 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.35 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.35 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.35 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.35 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14696758 | 0.81 | DPP4 (0.45) | DPP4PKMHSD11B1DPP8DPP9 | |
| SCHEMBL2965277 | 0.80 | KMT2A (0.47) | KMT2ASMN1; SMN2 | |
| SCHEMBL2761236 | 0.79 | PKM (0.45) | DPP4PKMDPP8DPP9FAP | |
| Ammonia Solution, Strong SCHEMBL11633437 | 0.78 | KMT2A (0.46) | KMT2ASMN1; SMN2 | |
| SCHEMBL30358180 | 0.78 | PKM (0.48) | DPP4PKMHSD11B1DPP8DPP9 | |
| SCHEMBL9918883 | 0.76 | GRIN2D (0.59) | DPP4PKMHSD11B1DPP8DPP9 | |
| SCHEMBL3878156 | 0.76 | PKM (0.47) | DPP4PKMDPP8DPP9FAP | |
| SCHEMBL9918349 | 0.76 | GRIN2D (0.59) | DPP4PKMHSD11B1DPP8DPP9 | |
| SCHEMBL12969797 | 0.76 | PKM (0.47) | DPP4PKMHSD11B1DPP8DPP9 | |
| SCHEMBL678338 | 0.76 | GRIN2D (0.59) | DPP4PKMHSD11B1DPP8DPP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |