SCHEMBL6833923

SCHEMBL6833923

[N-3].[N-3].[N-3].[N-3].[N-3].[Nb+5].[Nb+5].[Nb+5].[Nb].[Nb].[Nb]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15844214 0.87
SCHEMBL41912 0.82
SCHEMBL3171935 0.67
SCHEMBL5147017 0.67
SCHEMBL19056860 0.67
SCHEMBL3179193 0.67
SCHEMBL5827440 0.67
SCHEMBL865834 0.67
SCHEMBL16632139 0.67
SCHEMBL4865813 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4052738-A STYLUS FOR CAPACITIVE VIDEODISC MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JA) 1977-10-04 US claimed
US-6743473-B1 SEMICONDUCTOR DEVICES, METHOD FOR DEPOSITING METAL AND METAL NITRIDE LAYERS BY CHEMICAL VAPOR DEPOSITION OF A PRECURSOR, CYCLOPENTAIDENELY COMPLEX APPLIED MATERIALS, INC. 2004-06-01 US disclosed
US-6475902-B1 Chemical vapor deposition of niobium barriers for copper metallization APPLIED MATERIALS, INC. 2002-11-05 US disclosed
EP-1126046-A2 Chemical vapor deposition of barriers from novel precursors Applied Materials, Inc. (US) 2001-08-22 EP disclosed
US-4940983-A A/D converters STC PLC (GB) 1990-07-10 US disclosed