Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 4/20 | 0.32 |
| ▸ | ADH1B | P00325 | 1/20 | 0.31 |
| ▸ | ADH1C | P00326 | 1/20 | 0.31 |
| ▸ | ADH1A | P07327 | 1/20 | 0.31 |
| ▸ | ADH4 | P08319 | 1/20 | 0.31 |
| ▸ | ADH7 | P40394 | 1/20 | 0.31 |
| ▸ | CASP1 | P29466 | 1/20 | 0.31 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15227499 | 0.89 | NFE2L2 (0.31) | NFE2L2 | |
| SCHEMBL13619710 | 0.88 | — | — | |
| SCHEMBL7048958 | 0.88 | — | — | |
| SCHEMBL15227432 | 0.84 | — | — | |
| SCHEMBL3244388 | 0.84 | CYP1A2 (0.41) | NFE2L2CYP1A2SIGMAR1EPHX1HPGD | |
| SCHEMBL21921943 | 0.80 | — | — | |
| SCHEMBL20192181 | 0.80 | — | — | |
| SCHEMBL15227050 | 0.79 | — | — | |
| SCHEMBL16106998 | 0.78 | — | — | |
| SCHEMBL15304489 | 0.78 | DAO (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122010696-A | Preparation method of cyclohexyl ethyl vinyl ether | 西安国际医学中心有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-122010696-A | Preparation method of cyclohexyl ethyl vinyl ether | 西安国际医学中心有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-122010696-A | Preparation method of cyclohexyl ethyl vinyl ether | 西安国际医学中心有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-122010696-A | Preparation method of cyclohexyl ethyl vinyl ether | 西安国际医学中心有限公司 | 2026-05-12 | — | — | CN | disclosed |
| WO-2024143461-A1 | LAMINATE, ELECTRONIC DEVICE, COVER GLASS, AND RESIN COMPOSITION | 積水化学工業株式会社 | 2024-07-04 | — | — | WO | disclosed |
| CN-118284511-A | Laminate and electronic device | 积水化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| EP-3611206-B1 | MONOMER MIXTURE AND CURABLE COMPOSITION CONTAINING SAME | DAICEL CORP (JP) | 2024-02-21 | — | — | EP | disclosed |
| WO-2023153513-A1 | LAMINATE AND ELECTRONIC DEVICE | 積水化学工業株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023277060-A1 | LAMINATE, ELECTRONIC DEVICE, RESIN COMPOSITION AND COVER GLASS | 積水化学工業株式会社 | 2023-01-05 | — | — | WO | disclosed |
| CN-115011157-A | Coating agent for external package of battery pack | ＡＧＣ株式会社 | 2022-09-06 | — | — | CN | disclosed |
| US-20070048509-A1 | Antireflection film, polarizing plate, and image display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-01 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7022456-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| EP-1529089-A2 | THICK RADIATION SENSITIVE DEVICES | JP LABORATORIES, INC. (US) | 2005-05-11 | — | — | EP | disclosed |
| EP-1465010-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-06 | — | — | EP | disclosed |
| US-6743562-B2 | ACID GENERATORS; FOR THE PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20040048190-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-11 | — | — | US | disclosed |
| WO-2004017095-A2 | THICK RADIATION SENSITIVE DEVICES | JP LABORATORIES, INC. (US) | 2004-02-26 | — | — | WO | disclosed |
| US-20020172886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2002-11-21 | — | — | US | disclosed |