Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 15/20 | 0.55 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.55 |
| ▸ | CYP2C9 | P11712 | 5/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL683430 | 0.99 | HRH3 (0.52) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL14094041 | 0.87 | HRH3 (0.50) | HRH3KCNH2CYP2C9CYP3A4GAA | |
| SCHEMBL14461654 | 0.87 | HRH3 (0.50) | HRH3KCNH2CYP2C9CYP3A4GAA | |
| SCHEMBL10274540 | 0.87 | HRH3 (0.55) | HRH3KCNH2CYP2C9CYP3A4GAA | |
| SCHEMBL14443349 | 0.85 | HRH3 (0.52) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL14461652 | 0.84 | HRH3 (0.50) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL10228460 | 0.84 | HRH3 (0.52) | HRH3KCNH2CYP2C9CYP3A4GAA | |
| SCHEMBL14118168 | 0.83 | HRH3 (0.49) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL13898474 | 0.83 | HRH3 (0.51) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL683155 | 0.83 | KDM4E (0.42) | HRH3ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20120100481-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120100481-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| WO-2010150917-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-29 | — | — | WO | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |