Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 13/20 | 0.51 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.41 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 2/20 | 0.39 |
| ▸ | PPARA | Q07869 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10228460 | 0.87 | HRH3 (0.52) | HRH3KCNH2CYP2C9CYP3A4NFE2L2 | |
| SCHEMBL10274540 | 0.87 | HRH3 (0.55) | HRH3KCNH2CYP2C9CYP3A4NFE2L2 | |
| SCHEMBL16590942 | 0.87 | HRH3 (0.47) | HRH3KCNH2CYP2C9CYP3A4NFE2L2 | |
| SCHEMBL14443349 | 0.85 | HRH3 (0.52) | HRH3KCNH2CYP2C9CYP3A4KDM4E | |
| SCHEMBL19968012 | 0.83 | HRH3 (0.51) | HRH3KCNH2CYP2C9CYP3A4KDM4E | |
| SCHEMBL683429 | 0.83 | HRH3 (0.55) | HRH3KCNH2CYP2C9CYP3A4KDM4E | |
| SCHEMBL14998997 | 0.83 | HRH3 (0.46) | HRH3KCNH2CYP2C9CYP3A4NFE2L2 | |
| SCHEMBL14461654 | 0.82 | HRH3 (0.50) | HRH3KCNH2CYP2C9CYP3A4KDM4E | |
| SCHEMBL14461652 | 0.82 | HRH3 (0.50) | HRH3KCNH2CYP2C9CYP3A4KDM4E | |
| SCHEMBL14094041 | 0.82 | HRH3 (0.50) | HRH3KCNH2CYP2C9CYP3A4KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9563121-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition | FUJIFILM CORPORATION (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20140342275-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-7498116-B2 | Resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-03-03 | — | — | US | disclosed |
| US-7498116-B2 | Resist composition and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20080241750-A1 | RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241750-A1 | RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |