SCHEMBL683607

SCHEMBL683607

CCCCCCCCCCCCOCCOC(C)Oc1ccc(C(C)CC)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.40
ALDH1A1 P00352 5/20 0.39
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
TDP1 Q9NUW8 1/20 0.38
TSHR P16473 1/20 0.38
SLC2A1 P11166 1/20 0.36
MAPT P10636 2/20 0.36
THRB P10828 1/20 0.36
HTT P42858 1/20 0.36
NR5A1 Q13285 1/20 0.36
TRPM8 Q7Z2W7 1/20 0.35
LMNA P02545 2/20 0.35
USP2 O75604 1/20 0.35
CYP3A4 P08684 1/20 0.35
MAPK1 P28482 1/20 0.35
CASP1 P29466 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
SLCO1B3 Q9NPD5 1/20 0.35
SLCO1B1 Q9Y6L6 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683372 1.00 SLC7A5 (0.40) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL14252111 0.89 ALDH1A1 (0.47) ALDH1A1MEN1KMT2ATDP1TSHR
SCHEMBL682951 0.88 ALDH1A1 (0.48) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL12054775 0.87 SLC7A5 (0.46) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL14258787 0.87 SLC7A5 (0.46) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL6367423 0.85 SLC7A5 (0.47) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL14258895 0.85 ALDH1A1 (0.47) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL683286 0.83 SLC7A5 (0.43) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL14258788 0.82 SLC7A5 (0.47) SLC7A5ALDH1A1MEN1KMT2ATDP1
SCHEMBL13406766 0.82 ALDH1A1 (0.45) SLC7A5ALDH1A1MEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed