SCHEMBL6838772

SCHEMBL6838772

FC1(F)CC2CCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24587095 0.71 ALOX5AP (0.31)
SCHEMBL13917614 0.69 ALOX5AP (0.35)
SCHEMBL16904311 0.67 HSD11B1 (0.40)
SCHEMBL7569882 0.67
SCHEMBL1128193 0.67
SCHEMBL29642292 0.67
SCHEMBL8081901 0.67
SCHEMBL144395 0.67
SCHEMBL13967230 0.65 HSD11B1 (0.32)
SCHEMBL10945019 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023078231-A1 SARS-COV-2 INHIBITORS FOR TREATING CORONAVIRUS INFECTIONS INSILICO MEDICINE IP LIMITED (CN) 2023-05-11 WO disclosed
US-9663472-B2 Pyrazole compound SUMITOMO DAINIPPON PHARMA CO., LTD. (JP) 2017-05-30 US disclosed
US-6762268-B2 RADIATION TRANSPARENT, SENSITIVITY, CHEMICAL RESISTANCE SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-07-13 US disclosed
US-20030004289-A1 Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same SAMSUNG ELECTRONICS CO., LTD. 2003-01-02 US disclosed