⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4630256 | 0.92 | — | — | |
| SCHEMBL4629786 | 0.89 | — | — | |
| SCHEMBL3624070 | 0.81 | — | — | |
| SCHEMBL2272599 | 0.73 | — | — | |
| SCHEMBL2269510 | 0.71 | — | — | |
| SCHEMBL9516267 | 0.67 | — | — | |
| SCHEMBL7634048 | 0.65 | TSHR (0.47) | — | |
| SCHEMBL8385676 | 0.63 | TSHR (0.46) | — | |
| SCHEMBL68913 | 0.63 | — | — | |
| SCHEMBL616329 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3902938-A1 | COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS | Versum Materials US, LLC (US) | 2021-11-03 | — | — | EP | claimed |
| WO-2020160529-A1 | COMPOSITIONS AND METHODS USING SAME FOR SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2020-08-06 | — | — | WO | claimed |
| WO-2025080587-A2 | SILICON-CONTAINING FILMS HAVING SURFACES MODIFIED FROM HALOGENATED SILICON-CONTAINING COMPOUNDS | VERSUM MATERIALS US, LLC (US) | 2025-04-17 | — | — | WO | disclosed |
| WO-2025076009-A1 | SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS UTILIZING ORGANOAMINOPOLYSILOXANES AND ORGANOAMINOPOLYSILAZANES | VERSUM MATERIALS US, LLC (US) | 2025-04-10 | — | — | WO | disclosed |
| US-20040081912-A1 | Photosensitive polysilazane composition and method of forming patterned polysilazane film | AZ ELECTRONIC MATERIALS USA CORP. | 2004-04-29 | — | — | US | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |