⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6840908 | 0.81 | — | — | |
| SCHEMBL2271768 | 0.69 | — | — | |
| SCHEMBL2275770 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL1780608 | 0.61 | TSHR (0.39) | — | |
| SCHEMBL665762 | 0.60 | — | — | |
| SCHEMBL1070853 | 0.60 | — | — | |
| SCHEMBL6643241 | 0.57 | — | — | |
| Hydrochloric Acid SCHEMBL2784721 | 0.57 | — | — | |
| SCHEMBL207046 | 0.57 | — | — | |
| SCHEMBL8382190 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025080587-A2 | SILICON-CONTAINING FILMS HAVING SURFACES MODIFIED FROM HALOGENATED SILICON-CONTAINING COMPOUNDS | VERSUM MATERIALS US, LLC (US) | 2025-04-17 | — | — | WO | disclosed |
| CN-109851232-B | Method for manufacturing low reflection film on both sides | ＡＧＣ株式会社 | 2022-11-04 | — | — | CN | disclosed |
| CN-109415393-B | Process for producing N-silylaminoalkylsilane compound | 捷恩智株式会社 | 2021-08-03 | — | — | CN | disclosed |
| CN-107107543-B | Substrate with antifouling film | ＡＧＣ株式会社 | 2021-07-20 | — | — | CN | disclosed |
| EP-3480206-B1 | METHOD FOR PRODUCING N-SILYLAMINOALKYLSILANE COMPOUNDS | JNC CORP (JP) | 2020-10-21 | — | — | EP | disclosed |
| CN-111747659-A | Cover glass | ＡＧＣ株式会社 | 2020-10-09 | — | — | CN | disclosed |
| CN-111718131-A | Cover glass | ＡＧＣ株式会社 | 2020-09-29 | — | — | CN | disclosed |
| CN-106536440-B | Cover glass | ＡＧＣ株式会社 | 2020-09-01 | — | — | CN | disclosed |
| US-10435421-B2 | Method for producing N-silylaminoalkylsilane compound | JNC CORPORATION (JP) | 2019-10-08 | — | — | US | disclosed |
| US-20190225630-A1 | METHOD FOR PRODUCING N-SILYLAMINOALKYLSILANE COMPOUND | JNC CORPORATION (JP) | 2019-07-25 | — | — | US | disclosed |
| US-20170320294-A1 | GLASS LAMINATE AND PORTABLE ELECTRONIC DEVICE | ASAHI GLASS COMPANY, LIMITED (JP) | 2017-11-09 | — | — | US | disclosed |
| US-8471140-B2 | Porous silica precursor composition and method for preparing the precursor composition, porous silica film and method for preparing the porous silica film, semiconductor element, apparatus for displaying an image, as well as liquid crystal display | ULVAC, INC. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20100220274-A1 | POROUS SILICA PRECURSOR COMPOSITION AND METHOD FOR PREPARING THE PRECURSOR COMPOSITION, POROUS SILICA FILM AND METHOD FOR PREPARING THE POROUS SILICA FILM, SEMICONDUCTOR ELEMENT, APPARATUS FOR DISPLAYING AN IMAGE, AS WELL AS LIQUID CRYSTAL DISPLAY | ULVAC INC. (JP) | 2010-09-02 | — | — | US | disclosed |
| EP-1994100-A1 | METHOD FOR PRODUCING PRODUCT HAVING STAIN-PROOFING LAYER AND PRODUCT HAVING STAIN-PROOFING LAYER | SEIKO EPSON CORPORATION (JP) | 2008-11-26 | — | — | EP | disclosed |
| EP-1669795-B1 | STAINPROOF EYEGLASS LENS AND METHOD FOR PRODUCTION THEREOF | SEIKO EPSON CORP (JP) | 2008-05-14 | — | — | EP | disclosed |
| WO-2007119464-A1 | METHOD FOR PRODUCING PRODUCT HAVING STAIN-PROOFING LAYER AND PRODUCT HAVING STAIN-PROOFING LAYER | SEIKO EPSON CORPORATION (JP) | 2007-10-25 | — | — | WO | disclosed |
| US-7137701-B2 | Stain-proofing spectacle lens and manufacturing method thereof | SEIKO EPSON CORPORATION (JP) | 2006-11-21 | — | — | US | disclosed |
| EP-1669795-A1 | STAINPROOF EYEGLASS LENS AND METHOD FOR PRODUCTION THEREOF | SEIKO EPSON CORPORATION (JP) | 2006-06-14 | — | — | EP | disclosed |
| US-20050168685-A1 | Stain-proofing spectacle lens and manufacturing method thereof | SIEKO EPSON CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| US-4255549-A | Process for preparing organosilazanes | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) | 1981-03-10 | — | — | US | disclosed |