⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13838795 | 1.00 | — | — | |
| SCHEMBL12011139 | 1.00 | — | — | |
| SCHEMBL14667423 | 0.95 | KDM4E (0.44) | — | |
| SCHEMBL13173440 | 0.90 | HSD17B10 (0.44) | — | |
| Acetic Acid SCHEMBL605702 | 0.88 | TSHR (0.41) | — | |
| SCHEMBL325805 | 0.88 | KDM4E (0.52) | — | |
| SCHEMBL698450 | 0.88 | KDM4E (0.46) | — | |
| SCHEMBL14668934 | 0.87 | HSD17B10 (0.46) | — | |
| SCHEMBL7481671 | 0.86 | KDM4E (0.39) | — | |
| SCHEMBL17083481 | 0.85 | KDM4E (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014135390-A1 | INK COMPOSITION FOR PRODUCING SEMICONDUCTING THIN FILMS | BASF SE (DE) | 2014-09-12 | — | — | WO | claimed |
| EP-0662529-B1 | Degreasing cleaner and method for cleaning oil-deposited material | MITSUBISHI CHEM CORP (JP) | 1997-10-15 | — | — | EP | claimed |
| US-5674827-A | A THREE COMPONENT AQUEOUS MIXTURE COMPRISING 1,2-BUTANEDIOL, A WATER SOLUBLE ACYCLIC ETHER ALCOHOL, I.E., 1-TERT-BUTOXY-2-BUTANOL AND 4-METHYL-4-HYDROXY-2-PENTANONE; MATERIALS HANDLING; POLLUTION CONTROL | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-10-07 | — | — | US | claimed |
| EP-0662529-A1 | Degreasing cleaner and method for cleaning oil-deposited material | Mitsubishi Chemical Corporation (JP) | 1995-07-12 | — | — | EP | claimed |
| US-12421343-B2 | Composition for forming underlayer film for imprinting, method for producing composition for forming underlayer film, kit, pattern producing method, and method for manufacturing semiconductor element | FUJIFILM CORPORATION (JP) | 2025-09-23 | — | — | US | disclosed |
| CN-119882351-A | High-adhesion positive KrF photoresist resin composition | 万华化学集团股份有限公司 | 2025-04-25 | — | — | CN | disclosed |
| US-12242185-B2 | Curable composition, kit, interlayer, laminate, imprint pattern producing method, and method for manufacturing device | FUJIFILM CORPORATION (JP) | 2025-03-04 | — | — | US | disclosed |
| US-12109752-B2 | Composition for forming underlayer film in imprinting method, kit, pattern producing method, laminate, and method for manufacturing semiconductor element | FUJIFILM CORPORATION (JP) | 2024-10-08 | — | — | US | disclosed |
| US-12091497-B2 | Composition for forming underlayer film for imprinting, method for producing composition for forming underlayer film for imprinting, pattern producing method, method for manufacturing semiconductor element, cured product, and kit | FUJIFILM CORPORATION (JP) | 2024-09-17 | — | — | US | disclosed |
| EP-2785745-B1 | METHOD FOR SIMULTANEOUSLY SUBSTITUTING AND CROSS-LINKING A POLYSACCHARIDE BY MEANS OF THE HYDROXYL FUNCTIONS THEREOF | LAB VIVACY (FR) | 2024-02-21 | — | — | EP | disclosed |
| US-11899361-B2 | Kit, composition for forming underlayer film for imprinting, laminate, and production method using the same | FUJIFILM CORPORATION (JP) | 2024-02-13 | — | — | US | disclosed |
| US-11710641-B2 | Kit, composition for forming underlayer film for imprinting, pattern forming method, and method for manufacturing semiconductor device | FUJIFILM CORPORATION (JP) | 2023-07-25 | — | — | US | disclosed |
| EP-0701986-B1 | Process for production of unsaturated ether and catalyst used for production of unsaturated ether | NIPPON CATALYTIC CHEM IND (JP) | 1997-12-29 | — | — | EP | disclosed |
| EP-0662529-B1 | Degreasing cleaner and method for cleaning oil-deposited material | MITSUBISHI CHEM CORP (JP) | 1997-10-15 | — | — | EP | disclosed |
| US-5674827-A | A THREE COMPONENT AQUEOUS MIXTURE COMPRISING 1,2-BUTANEDIOL, A WATER SOLUBLE ACYCLIC ETHER ALCOHOL, I.E., 1-TERT-BUTOXY-2-BUTANOL AND 4-METHYL-4-HYDROXY-2-PENTANONE; MATERIALS HANDLING; POLLUTION CONTROL | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-10-07 | — | — | US | disclosed |
| US-5650544-A | Process for production of unsaturated ether and catalyst used for production of unsaturated ether | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-07-22 | — | — | US | disclosed |
| EP-0701986-A1 | Process for production of unsaturated ether and catalyst used for production of unsaturated ether | NIPPON SHOKUBAI CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |
| EP-0662529-A1 | Degreasing cleaner and method for cleaning oil-deposited material | Mitsubishi Chemical Corporation (JP) | 1995-07-12 | — | — | EP | disclosed |
| US-4304939-A | Preparation of N-phenyl-N-alkylphenylenediamines | UOP INC. (US) | 1981-12-08 | — | — | US | disclosed |
| US-4140718-A | Preparation of N,N'-dialkylphenylenediamines | UOP INC. (US) | 1979-02-20 | — | — | US | disclosed |