⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Peroxide SCHEMBL28780383 | 0.93 | — | — | |
| SCHEMBL9425846 | 0.93 | CRBN (0.50) | — | |
| SCHEMBL22493 | 0.93 | — | — | |
| SCHEMBL23002882 | 0.90 | — | — | |
| SCHEMBL4576144 | 0.90 | CRBN (0.47) | — | |
| Water SCHEMBL6337702 | 0.90 | — | — | |
| SCHEMBL17353590 | 0.90 | — | — | |
| Hydrochloric Acid SCHEMBL2672461 | 0.90 | — | — | |
| SCHEMBL28220720 | 0.90 | — | — | |
| Hydrogen Sulfide SCHEMBL28206896 | 0.90 | CRBN (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8338080-B2 | Forming a resist pattern to be thickened on an underlying object;applying a surfactant on the resist pattern to be thickened; applying a resist pattern thickening material comprising at least resin and a second surfactant on the resist pattern | FUJITSU LIMITED (JP) | 2012-12-25 | — | — | US | disclosed |
| US-20040110099-A1 | Process for forming resist pattern, semiconductor device and fabrication thereof | FUJITSU LIMITED (JP) | 2004-06-10 | — | — | US | disclosed |