SCHEMBL6847578

SCHEMBL6847578

CCN(CC)C([SiH2]Cl)N(CC)CC

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
FDPS P14324 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2103414 0.69 FDPS (0.31) FDPS
SCHEMBL2102332 0.65
SCHEMBL2103646 0.65
SCHEMBL12802419 0.65
SCHEMBL2100727 0.63
SCHEMBL610284 0.63
SCHEMBL2100847 0.62
SCHEMBL3213306 0.62
SCHEMBL26230557 0.62 FDPS (0.35) FDPS
SCHEMBL2504702 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040203255-A1 Method of forming Si-containing thin film MITSUBISHI MATERIALS CORPORATION (JP) 2004-10-14 US disclosed