Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6848035 | 0.83 | ALDH1A1 (0.55) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL6843989 | 0.83 | ALDH1A1 (0.55) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL9577034 | 0.76 | ALDH1A1 (0.70) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL31194758 | 0.74 | ALDH1A1 (0.71) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL8837737 | 0.74 | ALDH1A1 (0.71) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL4612527 | 0.73 | ALDH1A1 (0.65) | ALDH1A1CYP3A4TP53 | |
| SCHEMBL599333 | 0.72 | ALDH1A1 (0.73) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL29016773 | 0.72 | ALDH1A1 (0.73) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL31184251 | 0.72 | ALDH1A1 (0.58) | ALDH1A1CYP3A4TP53TSHRCYP2D6 | |
| SCHEMBL8908064 | 0.71 | ALDH1A1 (0.71) | ALDH1A1CYP3A4TP53TSHRCYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6770417-B2 | A NEGATIVE RESIST COMPOSITION COMPRISING A CONSTITUENT COMPONENT WHICH HAS A VINYL ETHER STRUCTURE PROTECTED WITH AN ACETAL IN A MOLECULE IS A FILM FORMING POLYMER SOLUBLE IN BASIC SOLUTION AND HAS AN ALKALI SOLUBLE GROUP | FUJITSU LIMITED (JP) | 2004-08-03 | — | — | US | disclosed |
| US-20020058197-A1 | Negative resist composition, process for forming resist patterns, and process for manufacturing electron device | FUJITSU LIMITED | 2002-05-16 | — | — | US | disclosed |
| EP-1184723-A2 | Negative resist composition, process for forming resist patterns, and process for manufacturing electronic device | FUJITSU LIMITED (JP) | 2002-03-06 | — | — | EP | disclosed |