SCHEMBL6854793

SCHEMBL6854793

CC(C[Si](C)(C)C)OC(=O)C1CC2C=CC1C2

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.48
KDM4E B2RXH2 2/20 0.41
LMNA P02545 1/20 0.41
POLB P06746 3/20 0.38
HSD17B10 Q99714 2/20 0.38
APEX1 P27695 1/20 0.38
RECQL P46063 1/20 0.38
BLM P54132 1/20 0.38
ESR2 Q92731 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
HPGD P15428 1/20 0.38
KMT2A Q03164 3/20 0.37
RAB9A P51151 1/20 0.37
MAPK1 P28482 1/20 0.33
CETP P11597 1/20 0.33
MEN1 O00255 1/20 0.32
ALOX15 P16050 1/20 0.32
TSHR P16473 1/20 0.32
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6861633 0.85 ALDH1A1 (0.52) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL3697508 0.84 ALDH1A1 (0.51) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL951662 0.84 ALDH1A1 (0.51) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL2138834 0.80 ALDH1A1 (0.48) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL9880127 0.80 ALDH1A1 (0.48) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL952719 0.80 ALDH1A1 (0.56) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL11800180 0.80 ALDH1A1 (0.56) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL7261134 0.79 ALDH1A1 (0.49) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL15412054 0.79 ALDH1A1 (0.47) ALDH1A1KDM4ELMNAPOLBHSD17B10
SCHEMBL16534235 0.79 ALDH1A1 (0.45) ALDH1A1KDM4ELMNAPOLBHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6780563-B2 SENSITIVITY AND RESOLUTION, RESISTANCE TO OXYGEN PLASMA ETCHING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-24 US disclosed
US-20020061465-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-23 US disclosed