SCHEMBL685818

SCHEMBL685818

C=CC(=O)OC1(C)CCCCCC1

nearest known ligand 0.39

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.39
TSHR P16473 6/20 0.32
HPGD P15428 1/20 0.31
ALDH1A1 P00352 3/20 0.30
TP53 P04637 2/20 0.30
HIF1A Q16665 2/20 0.30
CYP3A4 P08684 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685581 1.00 CYP19A1 (0.39) CYP19A1TSHRHPGDALDH1A1TP53
SCHEMBL75604 1.00 CYP19A1 (0.39) CYP19A1TSHRHPGDALDH1A1TP53
SCHEMBL14557144 1.00 CYP19A1 (0.39) CYP19A1TSHRHPGDALDH1A1TP53
SCHEMBL6906500 1.00 CYP19A1 (0.39) CYP19A1TSHRHPGDALDH1A1TP53
Ethylene SCHEMBL27829154 0.98 CYP19A1 (0.38) CYP19A1TSHRHPGD
SCHEMBL685834 0.98 CYP19A1 (0.37) CYP19A1TSHRHPGDALDH1A1TP53
SCHEMBL673387 0.94 TSHR (0.33) CYP19A1TSHRHPGDALDH1A1TP53
Maleic Acid SCHEMBL28793659 0.91 HCAR2 (0.35) CYP19A1TSHRTP53
Methacrylic Acid SCHEMBL27616774 0.89 CYP19A1 (0.34) CYP19A1
Crotonic Acid SCHEMBL28793677 0.87 CYP19A1 (0.33) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112980543-B High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity 英菲诺姆国际有限公司 2023-12-19 CN disclosed
EP-3839018-B1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME INFINEUM INT LTD (GB) 2023-10-18 EP disclosed
EP-3839019-B1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME INFINEUM INT LTD (GB) 2023-08-02 EP disclosed
US-11685874-B2 High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same INFINEUM INTERNATIONAL LIMITED (GB) 2023-06-27 US disclosed
US-11384311-B2 High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same INFINEUM INTERNATIONAL LIMITED (GB) 2022-07-12 US disclosed
US-11365273-B2 High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same INFINEUM INTERNATIONAL LIMITED (GB) 2022-06-21 US disclosed
US-20220169947-A1 High Viscosity Index Comb Polymer Viscosity Modifiers and Methods of Modifying Lubricant Viscosity Using Same INFINEUM INTERNATIONAL LIMITED (GB) 2022-06-02 US disclosed
US-20210189281-A1 High Viscosity Index Comb Polymer Viscosity Modifiers and Methods of Modifying Lubricant Viscosity Using Same lnfineum International Limited (GB) 2021-06-24 US disclosed
EP-3839019-A1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME Infineum International Limited (GB) 2021-06-23 EP disclosed
EP-3839018-A1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME Infineum International Limited (GB) 2021-06-23 EP disclosed
US-20070224538-A1 Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed
US-20070224538-A1 Positive Resist Compositions and Process for the Formation of Resist Patterns With the Same TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 US disclosed
US-7255971-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2007-08-14 US disclosed
US-7255971-B2 Positive resist composition FUJIFILM CORPORATION (JP) 2007-08-14 US disclosed
US-7252924-B2 Positive resist composition and method of pattern formation using the same FUJIFILM CORPORATION (JP) 2007-08-07 US disclosed
US-7252924-B2 Positive resist composition and method of pattern formation using the same FUJIFILM CORPORATION (JP) 2007-08-07 US disclosed
EP-1780224-A1 MULTIBRANCHED POLYMERS AND PROCESS FOR PRODUCTION THEREOF NIPPON SODA CO., LTD. (JP) 2007-05-02 EP disclosed
US-7195856-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-03-27 US disclosed
US-7195856-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-03-27 US disclosed
EP-1752479-A1 ACRYLIC STAR POLYMER NIPPON SODA CO., LTD. (JP) 2007-02-14 EP disclosed